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Angewandte Chemie, ISSN 0044-8249, 02/2013, Volume 125, Issue 8, p. 2307
Journal Article
Reproduction, Fertility and Development, ISSN 1031-3613, 2006, Volume 18, Issue 2, p. 279
Journal Article
Reproduction, Fertility and Development, ISSN 1031-3613, 2007, Volume 19, Issue 1, p. 246
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British Journal of Surgery, ISSN 0007-1323, 03/2001, Volume 88, Issue 3, pp. 393 - 399
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Angewandte Chemie, ISSN 0044-8249, 11/2006, Volume 118, Issue 45, pp. 7702 - 7705
Journal Article
Statistica Neerlandica, ISSN 0039-0402, 1998, Volume 3, pp. 303 - 324
Journal Article
06/2017
Verfahren zum Bilden einer Halbleitereinheit (200, 300), aufweisend: Bilden einer High-k-Gate-Dielektrikums-Schicht (120) auf einem Halbleitersubstrat, welches... 
SEMICONDUCTOR DEVICES | BASIC ELECTRIC ELEMENTS | ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR | ELECTRICITY
Patent
01/2015
Es werden Strukturen flacher Grabenisolierungen zur Verwendung mit UTBB(Ultra-Thin Body and Buried Oxide)-Halbleitersubstraten bereitgestellt, welche... 
SEMICONDUCTOR DEVICES | BASIC ELECTRIC ELEMENTS | ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR | ELECTRICITY
Patent
06/2014
Eine übliche Schnittmaske wird eingesetzt, um ein Gate-Muster und ein lokales Zwischenverbindungsmuster derart zu definieren, dass lokale... 
SEMICONDUCTOR DEVICES | BASIC ELECTRIC ELEMENTS | ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR | ELECTRICITY
Patent
03/2014
Ein System und ein Verfahren zum Oxidieren von Kontaminanten sowohl auf den Kathodenelektroden als auch auf den Anodenelektroden in einem... 
BASIC ELECTRIC ELEMENTS | ELECTRICITY | PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY
Patent
09/2013
Es wird ein FinFET mit verbesserter Gate-Planarität und ein Herstellungsverfahren offenbart. Die Gate-Zone ist vor dem Entfernen jeglicher unerwünschter Finnen... 
SEMICONDUCTOR DEVICES | BASIC ELECTRIC ELEMENTS | ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR | ELECTRICITY
Patent
06/2013
Es wird ein FinFET mit verbesserter Gate-Planarität und ein Herstellungsverfahren offenbart. Die Gate-Zone ist vor dem Entfernen jeglicher unerwünschter Finnen... 
SEMICONDUCTOR DEVICES | BASIC ELECTRIC ELEMENTS | ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR | ELECTRICITY
Patent
Physica Status Solidi (b), ISSN 0370-1972, 11/1977, Volume 84, Issue 1, pp. 171 - 174
Journal Article
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