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Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering, ISSN 0912-0289, 2018, Volume 84, Issue 10, pp. 821 - 824
Journal Article
Scientific Reports, ISSN 2045-2322, 12/2018, Volume 8, Issue 1, pp. 18058 - 11
Conventional low-temperature plasma treatment was reported to minimally improve the adhesion property of polytetrafluoroethylene (PTFE), whereas heat-assisted... 
GLASS | POLYMERS | FILM | SILICONE-RUBBER | MULTIDISCIPLINARY SCIENCES | POLY(DIMETHYLSILOXANE) | SURFACE MODIFICATION | IMPROVEMENT | FABRICATION | POLYTETRAFLUOROETHYLENE PTFE | Polytetrafluoroethylene | Adhesives | Product design | Rubber | Tetrafluoroethylene | Adhesion | Polydimethylsiloxane | Photoelectron spectroscopy
Journal Article
Scientific Reports, ISSN 2045-2322, 2015, Volume 5, Issue 1, p. 8947
The surface atomic step-terrace structure of 4H-SiC greatly affects its performance in power device applications. On the basis of the crystal structure of... 
SINGLE-CRYSTAL | MECHANISM | GAN | SUBSTRATE | MULTIDISCIPLINARY SCIENCES | GROWTH | CEO2 | SILICON-CARBIDE | PLANARIZATION | Competition | Chemical modification | Crystal structure
Journal Article
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering, ISSN 0912-0289, 2014, Volume 80, Issue 6, pp. 510 - 513
Journal Article
International Journal of Machine Tools & Manufacture, ISSN 0890-6955, 04/2017, Volume 115, p. 38
To realize the damage-free finishing of CVD-SiC substrates, which are used as materials for space telescope mirrors and glass lens molds, plasma chemical... 
Plasma | Mechanical polishing | Diamond machining | Etching | Surface roughness | Chemical-mechanical polishing | Surface finishing | Substrates | Vaporization | Diamond polishing | Lapping (finishing) | Abrasive finishing | Plasma etching | Chemical bonds | Abrasives | Damage | Finishing | Slurries
Journal Article
Applied Physics Letters, ISSN 0003-6951, 08/2015, Volume 107, Issue 5
Chemical mechanical polishing (CMP) combined with atmospheric-pressure plasma pretreatment was applied to a GaN (0001) substrate. The irradiation of a... 
Organic chemistry | Mechanical polishing | Gallium nitrides | Etch pits | Irradiation | Flat surfaces | Pretreatment | Chemical-mechanical polishing | Cerium oxides | Substrates | Slurries | Dislocations
Journal Article
Applied Physics Letters, ISSN 0003-6951, 03/2014, Volume 104, Issue 10, p. 101608
The thermal oxidation and water vapor plasma oxidation of 4H-SiC (0001) were investigated. The initial oxidation rate of helium-based atmospheric-pressure... 
EPITAXY | SINGLE-CRYSTAL | PHYSICS, APPLIED | MECHANISM | INTERFACE | SUBSTRATE | PERFORMANCE | GROWTH | SILICON-CARBIDE | LAYERS | Oxidation | Helium | Water vapor | Pits | Entrepreneurs | Oxidation rate | OXIDATION | PLASMA | SPECTROSCOPY | CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS | MATERIALS SCIENCE | HYDROGEN 4 | HELIUM | SILICON CARBIDES | SURFACES
Journal Article
RSC Advances, ISSN 2046-2069, 07/2019, Volume 9, Issue 40, pp. 22900 - 22906
Plasma surface treatment is typically not effective on fluoropolymers containing polytetrafluoroethylene (PTFE). It is reported that heat-assisted plasma (HAP)... 
Journal Article
Scientific Reports, ISSN 2045-2322, 12/2018, Volume 8, Issue 1, pp. 2376 - 9
In recent years, reaction-sintered silicon carbide (RS-SiC) has been of interest in many engineering fields because of its excellent properties, such as its... 
FABRICATION | ELECTROCHEMICAL CORROSION | MULTIDISCIPLINARY SCIENCES | MEAN FREE PATHS | CERAMICS | MIRROR | Etching | Conductance | Silicon | Silicon carbide
Journal Article
Applied Physics Letters, ISSN 0003-6951, 10/2013, Volume 103, Issue 18, p. 189901
Journal Article
Applied Physics Letters, ISSN 0003-6951, 10/2013, Volume 103, Issue 18
Journal Article
Electrochemistry Communications, ISSN 1388-2481, 03/2015, Volume 52, pp. 5 - 8
Electro-chemical mechanical polishing (ECMP), which combines anodic oxidation and soft abrasive polishing, was applied to single-crystal SiC. Ceria (CeO2)... 
Scratch | SiC | Electro-chemical mechanical polishing | Roughness | Subsurface-damaged layer | ELECTROCHEMISTRY | SILICON-CARBIDE | THERMAL-OXIDATION
Journal Article
Applied Surface Science, ISSN 0169-4332, 03/2018, Volume 434, pp. 40 - 48
•Our results revealed that CeO2 slurry has better polishing performance compared with diamond, Al2O3 and SiO2 slurries.•Scratch removal mechanism in... 
Scratch-free | Atomic step | Silicon carbide | Chemical mechanical polishing | Thermal oxidation | WAFERS | PHYSICS, CONDENSED MATTER | PHYSICS, APPLIED | CHEMICAL-VAPOR-DEPOSITION | SILICON | CMP | CHEMISTRY, PHYSICAL | SUBSTRATE | GROWTH | SURFACE | PLANARIZATION | MATERIALS SCIENCE, COATINGS & FILMS | Oxidation-reduction reaction | Hardness | Mechanical engineering
Journal Article
International Journal of Machine Tools and Manufacture, ISSN 0890-6955, 04/2017, Volume 115, pp. 38 - 46
To realize the damage-free finishing of CVD-SiC substrates, which are used as materials for space telescope mirrors and glass lens molds, plasma chemical... 
Plasma chemical vaporization machining | Etching | Plasma-assisted polishing | Finishing | CVD-SiC | OXIDATION | MECHANISM | SILICON-CARBIDE | ENGINEERING, MECHANICAL | MIRROR | SURFACE | FABRICATION | ENGINEERING, MANUFACTURING | Chemical vapor deposition | Analysis | Silicon carbide
Journal Article
Scientific Reports, ISSN 2045-2322, 12/2017, Volume 7, Issue 1, pp. 9476 - 9
The heating effect on the adhesion property of plasma-treated polytetrafluoroethylene (PTFE) was examined. For this purpose, a PTFE sheet was plasma-treated at... 
ENERGY | XPS | FILM | MULTIDISCIPLINARY SCIENCES | ATMOSPHERIC-PRESSURE | SURFACES | Plasma | Scanning electron microscopy | Spectroscopy | Polytetrafluoroethylene | Compression | Mechanical properties | Etching | Product design | Rubber | Photoelectron spectroscopy | Isoprene
Journal Article
Electrochimica Acta, ISSN 0013-4686, 05/2018, Volume 271, p. 666
In an attempt to realize the high-quality and highly efficient polishing of SiC, the anodic oxidation mechanism of SiC was studied to enable the application of... 
Atomic force microscopy | Mechanical polishing | Conductivity | Voltammetry | Chemical-mechanical polishing | Substrates | Organic chemistry | Anodizing | Etch pits | Oxidation | Diffusion | Charge transfer | Electric properties
Journal Article
ANALYTICAL SCIENCES, ISSN 0910-6340, 12/2019, Volume 35, Issue 12, pp. 1333 - 1340
Human antithrombin (AT) has two isoforms of which the predominant alpha-form is glycosylated on all four possible glycosylation sites and the lower abundant... 
fucose | CHEMISTRY, ANALYTICAL | SIDE-CHAIN | oligosaccharide profile | CARBOHYDRATE | ISOFORM | GLYCOSYLATION | Antithrombin | BETA-ANTITHROMBIN | VARIANT | MASS-SPECTROMETRY | QUADRUPOLE ION-TRAP | glyco-engineering | HEPARIN AFFINITY | HIGH-MANNOSE | Technology | Isoforms | Glycosylation | Mannose | Oligosaccharides | Safety | Glycan | Fucose | Recombinant
Journal Article
Electrochemistry Communications, ISSN 1388-2481, 03/2015, Volume 52, p. 5
To access, purchase, authenticate, or subscribe to the full-text of this article, please visit this link: http://dx.doi.org/10.1016/j.elecom.2015.01.002 *... 
Silicon carbide | Cerium | Electrolytes | Usage | Hardness
Journal Article
Applied Physics Letters, ISSN 0003-6951, 08/2015, Volume 107, Issue 5, p. 51602
Chemical mechanical polishing (CMP) combined with atmospheric-pressure plasma pretreatment was applied to a GaN (0001) substrate. The irradiation of a... 
DIAMOND | PLANARIZATION | PHYSICS, APPLIED | DISLOCATIONS | CERIUM OXIDES | CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS | GALLIUM FLUORIDES | SUBSTRATES | MECHANICAL POLISHING | SLURRIES | ROUGHNESS | LAYERS | IRRADIATION | PLASMA | SPECTROSCOPY | CARBON TETRAFLUORIDE | ATMOSPHERIC PRESSURE | GALLIUM NITRIDES | SURFACES
Journal Article
Materials Science & Engineering A, ISSN 0921-5093, 2010, Volume 527, Issue 16, pp. 4103 - 4108
Carbon nanotube (CNT) is an effective reinforcement used to improve the mechanical and thermal responses of metal matrix composites. It is, however, obvious... 
Carbon nanotubes | Magnesium oxide layer | Composite | Powder | Strength | Magnesium alloy | MATERIALS SCIENCE, MULTIDISCIPLINARY | METALLURGY & METALLURGICAL ENGINEERING | NANOSCIENCE & NANOTECHNOLOGY | YOUNGS MODULUS
Journal Article
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