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ChemPhysChem, ISSN 1439-4235, 04/2014, Volume 15, Issue 6, pp. 1148 - 1153
ZnO thin films having a nanocolumnar microstructure are grown by plasma‐enhanced chemical vapor deposition at 423 K on pre‐treated fluorine‐doped tin oxide... 
ZnO | perovskite | plasma‐enhanced chemical vapor deposition | solid‐state solar cells | photovoltaics | solid-state solar cells | plasma-enhanced chemical vapor deposition | Thin films | Solar cells | Perovskite | Annealing | Solar batteries | Zinc oxide | Dielectric films | Chemical vapor deposition
Journal Article
Plasma Processes and Polymers, ISSN 1612-8850, 02/2019, Volume 16, Issue 2, pp. 1800135 - n/a
The influence of one dimensional substrate patterns on the nanocolumnar growth of thin films deposited by magnetron sputtering at oblique angles is... 
magnetron sputtering | nanostructures | patterned substrate | oblique angle deposition | thin films | PHYSICS, CONDENSED MATTER | PHYSICS, APPLIED | POLYMER SCIENCE | PHYSICS, FLUIDS & PLASMAS | DEPOSITION | FABRICATION | Thin films | Thickness | Magnetron sputtering | Morphology | Topography | Growth models | Substrates | Silicon dioxide
Journal Article
International Journal of Hydrogen Energy, ISSN 0360-3199, 06/2015, Volume 40, Issue 23, pp. 7382 - 7387
Uniform, highly porous, columnar thin films incorporating YSZ and NiO prepared by magnetron sputtering with deposition at glancing incidence exhibited... 
Oblique angle deposition | Ni-YSZ | Magnetron sputtering | Thin film anodes | SOFC | GLANCING ANGLES | CERMETS | ELECTROCHEMISTRY | ENERGY & FUELS | DEPOSITION | CHEMISTRY, PHYSICAL | SOFC ANODE | ELECTROCHROMIC BEHAVIOR | Thin films | Annealing | Fuel cell industry | Hydrogen | Fuel cells | Dielectric films | Electric properties
Journal Article
Plasma Processes and Polymers, ISSN 1612-8850, 12/2016, Volume 13, Issue 12, pp. 1242 - 1248
The deposition of SiOx (x≤2) compound thin films by the reactive magnetron sputtering technique at oblique angles is studied from both theoretical and... 
silicon oxide | stoichiometry control | physical vapour deposition (PVD) | reactive magnetron sputtering | thin films | PHYSICS, CONDENSED MATTER | PHYSICS, APPLIED | POLYMER SCIENCE | CHEMISORPTION | PHYSICS, FLUIDS & PLASMAS | DEPOSITION RATES | NITROGEN | MORPHOLOGY | SURFACES | Thin films | Dielectric films
Journal Article
Plasma Processes and Polymers, ISSN 1612-8850, 10/2016, Volume 13, Issue 10, pp. 960 - 964
Target poisoning in reactive magnetron sputtering deposition of thin films is an undesired phenomenon, well known for causing a drastic fall of the process... 
target poisoning | titanium oxide | physical vapour deposition (PVD) | reactive magnetron sputtering | thin films | PHYSICS, CONDENSED MATTER | PHYSICS, APPLIED | POLYMER SCIENCE | OXIDE THIN-FILMS | PHYSICS, FLUIDS & PLASMAS | TIO2 | Thin films | Dielectric films | Extrapolation | Magnetron sputtering | Efficiency | Poisoning | Polymers | Titanium dioxide | Deposition
Journal Article