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electricity (15) 15
electric techniques not otherwise provided for (13) 13
x-ray technique (13) 13
euv lithography (12) 12
euv source (10) 10
laser produced plasma (10) 10
physics (10) 10
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lithography (5) 5
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brazing (4) 4
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performing operations (4) 4
polymer sciences (4) 4
single crystals (4) 4
solder (4) 4
spectroscopy (4) 4
transporting (4) 4
accumulators (3) 3
apparatus specially adapted therefor (3) 3
basic electric elements (3) 3
blasting (3) 3
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brazing alloys (3) 3
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engineering, electrical & electronic (3) 3
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heating (3) 3
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ketones (3) 3
lighting (3) 3
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nickel base alloys (3) 3
non-positive displacement pumps (3) 3
organic glasses (3) 3
originals therefor (3) 3
photography (3) 3
photomechanical production of textured or patterned surfaces,e.g. for printing, for processing of semiconductordevices (3) 3
physics, applied (3) 3
physics, atomic, molecular & chemical (3) 3
positive displacement machines for liquids (3) 3
proteins (3) 3
pumps for liquids or elastic fluids (3) 3
system (3) 3
techniques for handling particles or ionising radiation nototherwise provided for (3) 3
tunneling dynamics (3) 3
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1-arylethanones (2) 2
acid (2) 2
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euv (2) 2
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Polymer Science, Series D, ISSN 1995-4212, 7/2017, Volume 10, Issue 3, pp. 230 - 235
The results of the development of new domestic semifinished products of nondeformable solders, such as tapes and pastes of solders on an organic binder, are... 
Polymer Sciences | tapes of powder solders | Chemistry | solder organic binder | pastes of powder solders | MBM-5S acrylic dispersion | semifinished nondeformable solder | copolymer of BMK-5 acrylic resin | Powders | Acrylic resins
Journal Article
Journal of Applied Physics, ISSN 0021-8979, 09/2019, Volume 126, Issue 11, p. 113103
We present measurements from laser-produced plasmas generated using cryogenic Xe targets and quantify the emission characteristics in the soft x-ray region (1... 
PHYSICS, APPLIED | ULTRAVIOLET | SIZE
Journal Article
Journal of Physics D: Applied Physics, ISSN 0022-3727, 12/2004, Volume 37, Issue 23, pp. 3266 - 3276
The application of a dense plasma focus pinch discharge as a light source for extreme ultraviolet (EUV) lithography is discussed. For operation with xenon gas,... 
PHYSICS, APPLIED | INNER ELECTRODE | PERFORMANCE | X-RAY-EMISSION | PINCH PLASMAS | DEVICE | OPTIMIZATION | GENERATION | RADIATION SOURCE | LITHOGRAPHY
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2011, Volume 7969
The development of a successful extreme ultraviolet light source for lithography relies on the ability to maintain collector optic cleanliness. Cleanliness is... 
Conference Proceeding
Synthesis, ISSN 0039-7881, 4/2006, Volume 2006, Issue 7, pp. 1087 - 1092
ABSTRACT 1-Arylethanones and related compounds are brominated in dioxane with the H 2 O 2 -HBr aq system, resulting in the replacement of two hydrogen atoms in... 
paper | 2,2-dibromo-1-aryl-ethanones | Acetophenones | 1-arylethanones | Hydrogen peroxide | Bromination | acetophenones | ACID | REAGENTS | hydrogen peroxide | CHEMISTRY, ORGANIC | CARBONYL-COMPOUNDS | HALOGENATION | AROMATIC-COMPOUNDS | TETRASULFUR TETRANITRIDE | ALPHA-BROMO | KETONES | OXIDATIVE CHLORINATION | HYDROGEN-PEROXIDE | 2,2-dibromo-1-arylethanones | bromination
Journal Article
Synthesis, ISSN 0039-7881, 12/2004, Volume 2004, Issue 17, pp. 2845 - 2848
ABSTRACT 1-Arylethanones are readily chlorinated with an aqueous HCl-H 2 O 2 system using ethanol as a cosolvent. The reaction proceeds rapidly and results in... 
paper | 1-aryl-2,2-dichloroethanones | 1-arylethanones | Chlorination | Hydrogen peroxide | ACID | MANGANESE(III) ACETATE | hydrogen peroxide | ARENES | CHEMISTRY, ORGANIC | HALOGENATION | KETONES | BROMINATION | MOLECULAR-REARRANGEMENTS | HYDROGEN-PEROXIDE | chlorination | CHLORIDE
Journal Article
Journal of Micro Nanolithography MEMS and MOEMS, ISSN 1932-5150, 10/2009, Volume 8, Issue 4, pp. 041504 - 0415011
Improved performance and specific results are reported for several test and prototype extreme ultraviolet (EUV) light sources developed for next-generation... 
laser-produced plasma (LPP) | EUV source | plasma | EUV lithography | collector | Collector | Plasma | Laser-produced plasma (LPP) | MATERIALS SCIENCE, MULTIDISCIPLINARY | NANOSCIENCE & NANOTECHNOLOGY | OPTICS | ENGINEERING, ELECTRICAL & ELECTRONIC | Collectors | Lithography | Accumulators | Prototypes | Droplets | Spectra | Nanostructure | Light sources
Journal Article
Journal of Applied Physics, ISSN 0021-8979, 09/2019, Volume 126, Issue 11
We present measurements from laser-produced plasmas generated using cryogenic Xe targets and quantify the emission characteristics in the soft x-ray region (1... 
YAG lasers | Semiconductor lasers | Lasers | Xenon | Soft x rays | Emission | Plasmas | Neodymium lasers
Journal Article
Microelectronic Engineering, ISSN 0167-9317, 2009, Volume 86, Issue 4, pp. 509 - 512
This paper describes the development of a LPP EUV source using a CO 2 laser with tin droplet targets. Burst power of 100 W and average power of 25 W has been... 
NANOSCIENCE & NANOTECHNOLOGY | PHYSICS, APPLIED | OPTICS | ENGINEERING, ELECTRICAL & ELECTRONIC
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2009, Volume 7271
This paper is devoted to the development of laser produced plasma (LPP) EUV source architecture for advanced lithography applications in high volume... 
Collector | Plasma | Laser produced plasma | EUV source | EUV lithography
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2011, Volume 7969
Laser produced plasma (LPP) systems have been developed as a viable approach for the EUV scanner light sources to support optical imaging of circuit features... 
Laser Produced Plasma | EUV source | EUV lithography | Electric power generation | Lasers | Circuits | Lithography | Electricity consumption | Optical scanners | Mathematical models | Light sources
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2009, Volume 7271
Laser produced plasma (LPP) systems have been developed as a viable approach for the EUV scanner light source for optical imaging of circuit features at... 
Laser produced plasma | EUV source | EUV lithography | Normal incidence collector
Conference Proceeding
Optics Letters, ISSN 0146-9592, 04/1999, Volume 24, Issue 8, pp. 513 - 515
A photochromic reaction in Zn-tetrabenzoporphyrine-doped poly(methyl methacrylate) was investigated at room temperature. A one-quantum thermoreversible... 
OPTICS
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2011, Volume 7969
This paper describes the development of laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source architecture for advanced lithography applications in high... 
Laser Produced Plasma | EUV source | EUV lithography
Conference Proceeding
Journal of Chemical Physics, ISSN 0021-9606, 07/2000, Volume 113, Issue 2, pp. 876 - 882
Spectral diffusion (SD) in polymethylmethacrylate (PMMA) doped with free-base tetraphenylporphine is investigated at 0.5-4.2 K on a time scale of 3-10(6) s via... 
HEAT RELEASE | ORGANIC GLASSES | LINEWIDTHS | SOFT-POTENTIAL MODEL | TUNNELING DYNAMICS | PHOTON-ECHO | PHYSICS, ATOMIC, MOLECULAR & CHEMICAL | THERMAL-CONDUCTIVITY | PROTEINS | LOW-TEMPERATURE | DEPENDENCE
Journal Article
Russian Metallurgy (Metally), ISSN 0036-0295, 12/2019, Volume 2019, Issue 12, pp. 1264 - 1267
The microstructure of a 1417M alloy after magnetohydrodynamic (MHD) treatment has been studied. An electric field induced in the aluminum alloy melt is shown... 
Intermetallic phases | Aluminum base alloys | Aluminum alloys | Magnetohydrodynamics | Electric fields | Fluid flow
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 03/2010, Volume 7636
This paper describes the development of laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source architecture for advanced lithography applications in high... 
Collectors | Lithography | Accumulators | Carbon dioxide | Metrology | Droplets | Debris | Incidence
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 03/2010, Volume 7636
Laser produced plasma (LPP) systems have been developed as a viable approach for the EUV scanner light source to support optical imaging of circuit features at... 
Journal Article
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