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PLoS Computational Biology, ISSN 1553-734X, 05/2019, Volume 15, Issue 5, pp. e1007063 - e1007063
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 3/2018, Volume 10583, pp. 105830L - 105830L-12
This paper summarizes findings for an N5 equivalent M2 (pitch 32) layer patterned by means of SE EUV. Different mask tonalities and resist tonalities have been... 
RET | SRAF | CD-SEM | EUV | N5 | DF mask | Metal layer patterning | retargeting | etch | LCDU | BF mask | BEOL
Conference Proceeding
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