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Angewandte Chemie International Edition, ISSN 1433-7851, 10/2018, Volume 57, Issue 44, pp. 14538 - 14542
Rhenium is both a refractory metal and a noble metal that has attractive properties for various applications. Still, synthesis and applications of rhenium thin... 
atomic layer deposition (ALD) | rhenium | rhenium nitrides | thin films | AMMONIA-SYNTHESIS | CHEMISTRY, MULTIDISCIPLINARY | CATALYSTS | Thin films | Metallic films | Nitrides | Dielectric films | Electric properties | Composition | Refractory metals | Films | Metals | Heavy metals | Ammonia | Atomic layer deposition | Metal films | Surface reactions | Morphology | Surface mount technology | Rhenium | Noble metals | Deposition
Journal Article
Optical Materials, ISSN 0925-3467, 05/2016, Volume 55, pp. 164 - 167
Novel approach in the detection of radiation damage created by ion beams in optical materials was demonstrated. Protons of the energy of 100 keV and fluence of... 
Cathodoluminescence | Radiation resistance | wide-gap optical materials | Radiation | Protons | Nuclear reactors | Crystal defects | Crystal lattices | Crystals | Luminescence | Irradiation | Optical materials | Adjustable
Journal Article
Journal of Physical Chemistry A, ISSN 1089-5639, 03/2015, Volume 119, Issue 11, pp. 2298 - 2306
Bi2Te3 thin films were deposited by atomic layer deposition (ALD) from BiCl3 and (Et3Si)2Te at 160-300 °C. The process was studied in detail, and growth... 
Journal Article
Optical Materials, ISSN 0925-3467, 10/2019, Volume 96
Intrinsic properties of optical ceramics of MgAl O have been studied by means of low-temperature cathodo-, photo- and thermo-luminescence methods. Based on the... 
Cathodo- and photoluminescence | Structural defects | Intrinsic excitations | Proton irradiation | Optical absorption | Magnesium aluminate spinel
Journal Article
Chemistry of Materials, ISSN 0897-4756, 08/2017, Volume 29, Issue 15, pp. 6502 - 6510
Journal Article
Chemistry of Materials, ISSN 0897-4756, 02/2019, Volume 31, Issue 3, pp. 1101 - 1109
Journal Article
NANOSCALE RESEARCH LETTERS, ISSN 1556-276X, 02/2019, Volume 14, Issue 1, pp. 1 - 8
Journal Article
Thin Solid Films, ISSN 0040-6090, 08/2017, Volume 636, p. 26
To access, purchase, authenticate, or subscribe to the full-text of this article, please visit this link: http://dx.doi.org/10.1016/j.tsf.2017.05.026 * Ternary... 
Thin films | Analysis | Aluminum compounds | Electrolytes | Fluorides | Dielectric films | Batteries | Electric properties
Journal Article
Thin Solid Films, ISSN 0040-6090, 08/2017, Volume 636, pp. 26 - 33
Journal Article
Chemistry of Materials, ISSN 0897-4756, 07/2017, Volume 29, Issue 14, pp. 6130 - 6136
Five Au(III) compounds were synthesized and evaluated for atomic layer deposition of Au thin films. One of the compounds, Me2Au(S2CNEt2), showed optimal... 
CVD | CHEMICAL-VAPOR-DEPOSITION | DIMETHYLGOLD(III) CARBOXYLATES | CRYSTAL-STRUCTURE | BEHAVIOR | 8-MERCAPTOQUINOLINATE | MATERIALS SCIENCE, MULTIDISCIPLINARY | COMPLEXES | BETA-DIKETONES | CHEMISTRY, PHYSICAL | PRECURSORS | MOCVD
Journal Article
Nanoscale Research Letters, ISSN 1931-7573, 12/2019, Volume 14, Issue 1, p. 1
In this work, we report the successful growth of high-quality SiO.sub.2 films by low-temperature plasma-enhanced atomic layer deposition using an oxidant which... 
Journal Article
Chemistry of Materials, ISSN 0897-4756, 05/2018, Volume 30, Issue 10, pp. 3499 - 3507
In this paper, we introduce a new Co precursor for the atomic layer deposition (ALD) of Co metal and other Co containing materials. CoCl2(TMEDA) (TMEDA = N,N,N... 
TRANSITION | OXYGEN EVOLUTION | PLASMA ALD METHOD | MATERIALS SCIENCE, MULTIDISCIPLINARY | COMPLEXES | GROWTH | CO3O4 | CHEMISTRY, PHYSICAL | WATER OXIDATION | CATALYST | CPCO(CO)
Journal Article
CHEMISTRY OF MATERIALS, ISSN 0897-4756, 08/2019, Volume 31, Issue 15, pp. 5713 - 5724
Semiconducting two-dimensional (2D) materials are studied intensively because of their promising performance in diverse applications from electronics to energy... 
CHEMISTRY, PHYSICAL | TRANSISTORS | CARBON | OXIDE THIN-FILMS | MATERIALS SCIENCE, MULTIDISCIPLINARY
Journal Article
CHEMISTRY OF MATERIALS, ISSN 0897-4756, 07/2019, Volume 31, Issue 14, pp. 5314 - 5319
This work presents preparation of nickel germanide (Ni2Ge) thin films by atomic layer deposition (ALD). The films were grown using NiCl2(tmpda) (tmpda =... 
COBALT(II) | CHEMISTRY, PHYSICAL | SILICIDES | RESISTIVITY | MATERIALS SCIENCE, MULTIDISCIPLINARY | COMPLEXES
Journal Article
CHEMISTRY OF MATERIALS, ISSN 0897-4756, 02/2019, Volume 31, Issue 3, pp. 1101 - 1109
Atomic layer deposition (ALD) enables the deposition of numerous materials in thin film form, yet there are no ALD processes for metal iodides. Herein, we... 
ENERGY | LEAD IODIDE | OPTICAL-CONSTANTS | MATERIALS SCIENCE, MULTIDISCIPLINARY | PEROVSKITE SOLAR-CELLS | CHEMISTRY, PHYSICAL | AL2O3
Journal Article
Thin Solid Films, ISSN 0040-6090, 08/2017, Volume 636, pp. 26 - 33
The ternary lithium aluminum fluoride Li AlF is formed from two optically interesting fluorides, LiF and AlF . It has been reported to have a large electronic... 
Thin films | Fluoride thin films | Conversion reaction | Lithium aluminum fluoride | PHYSICS, CONDENSED MATTER | ALD PROCESS | PHYSICS, APPLIED | MATERIALS SCIENCE, MULTIDISCIPLINARY | IONIC-CONDUCTIVITY | ELECTROLYTES | BATTERIES | FLUORIDE | TIF4 PRECURSORS | OXIDES | LITHIUM | ATOMIC LAYER DEPOSITION | MATERIALS SCIENCE, COATINGS & FILMS
Journal Article
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