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1992, Probleme der Semiotik, ISBN 9783923721221, Volume Bd. 11., 128
Book
2012, Routledge studies in multimodality, ISBN 9780415883511, Volume 5, viii, 330
This book presents a new basis for the empirical analysis of film. Starting from an established body of work in film theory, the authors show how a close... 
Motion pictures | Philosophy | Semiotics | Discourse Analysis | Film Theory | Language and Media | Motion pictures - Semiotics | Modality (Linguistics) | Linguistic analysis (Linguistics)
Book
Theologische Literaturzeitung, ISSN 0040-5671, 01/1997, Volume 122, p. 103
Journal Article
2012, Routledge studies in multimodality, ISBN 0415883512, Volume 5
Web Resource
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2009, Volume 7272
Today, mask metrology is performed on dedicated registration test patterns in the kerf area between active dies. Accordingly, the measurement performance of... 
Advanced reticles | LMS IPRO4 | In-die measurement | Lithography | Registration metrology | Double patterning
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2010, Volume 7545
Double Patterning Lithography (DPL) techniques for next generation wafer exposures are placing greater demand on the requirements for pattern placement... 
LMS IPRO4 | Registration metrology | In-die registration measurement | Advanced reticles | Mask metrology | Double patterning lithography | Through-pellicle measurement | Demand | Specifications | Placement | Wafers | Metrology | Distortion | Masks | Marketing
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 05/2010, Volume 7748
Double Patterning Lithography (DPL) for next-generation wafer exposure is placing greater demands on the requirements for pattern placement accuracy on... 
Permissible error | Reticles | Error analysis | Semiconductors | Lithography | Placement | Deviation | Masks
Journal Article
KODIKAS/CODE-Ars Semeiotica, ISSN 0171-0834, 07/2008, Volume 31, Issue 3-4, pp. 217 - 270
Part 3 of this series of articles, of which part 1 appeared in Kodikas/Code, 2002, 25, 64-94 & part 2, in Kodikas/Code, 2004, 27, 95-123, continues the... 
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2009, Volume 7470
Double patterning is considered as an upcoming class of technologies for the 32nm node photolithography processes and beyond. Several different double... 
Pattern placement | Mask metrology | Overlay | Registration metrology | Double patterning
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2010, Volume 7748
Conference Proceeding
Kodikas/Code. Ars Semeiotica: An International Journal of Semiotics, ISSN 0171-0834, 2004, Volume 27, Issue 3-4, p. 255
Journal Article
2016, Fassung für Viola und Klavier., Quellenpublikationen aus dem Archiv der Sing-Akademie zu Berlin, Volume Band 12
Music Score
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