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Japanese journal of applied physics. Pt. 1, Regular papers & short notes, ISSN 0021-4922, 03/1998, Volume 37, Issue 3 A, pp. 796 - 800
A new technique of determining the effective channel length by directly measuring source-drain series resistance of metal-oxide-semiconductor field-effect... 
Effective channel length | MOSFET | Degenerate MOSFET | Source-drain series resistance | Gate length | LDD MOSFETS | effective channel length | PHYSICS, APPLIED | source-drain series resistance | degenerate MOSFET | gate length
Journal Article
09/2011
A method of manufacturing doping patterns includes providing a substrate having a plurality of STIs defining and electrically isolating a plurality of active... 
SEMICONDUCTOR DEVICES | BASIC ELECTRIC ELEMENTS | ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR | ELECTRICITY
Patent
02/2008
A method of moving bubbles includes utilizing an optical tweezers to form a photo resist brightness area and a photo resist darkness area in the photo resist... 
ELECTROGRAPHY | PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES | HOLOGRAPHY | MATERIALS THEREFOR | APPARATUS SPECIALLY ADAPTED THEREFOR | PHOTOGRAPHY | CINEMATOGRAPHY | PHYSICS | ORIGINALS THEREFOR
Patent
International Journal of Microcircuits and Electronic Packaging, ISSN 1063-1674, 03/1999, Volume 22, Issue 1, pp. 6 - 12
Journal Article
WSEAS Transactions on Systems and Control, ISSN 1991-8763, 2014, Volume 9, Issue 1, pp. 540 - 546
Journal Article
06/2013
A method of manufacturing doping patterns includes providing a substrate having a plurality of STIs defining and electrically isolating a plurality of active... 
SEMICONDUCTOR DEVICES | BASIC ELECTRIC ELEMENTS | ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR | ELECTRICITY
Patent
09/2011
A method of manufacturing doping patterns includes providing a substrate having a plurality of STIs defining and electrically isolating a plurality of active... 
SEMICONDUCTOR DEVICES | BASIC ELECTRIC ELEMENTS | ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR | ELECTRICITY
Patent
12/2009
To avoid the yield of wafers that undergo immersion lithography influencing by delay of post exposure baking (PEB), an operation system adjusts a speed of... 
Patent
INT J MICROCIRCUITS ELECTRON PACKAG, ISSN 1063-1674, 01/1999, Volume 22, Issue 1, pp. 6 - 12
The conventional technique for over-temperature protection of circuits is to use comparators to compare the voltage of temperature sensors with a reference... 
Journal Article
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