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IEEE Transactions on Image Processing, ISSN 1057-7149, 11/2017, Volume 26, Issue 11, pp. 5176 - 5187
We develop techniques to solve ill-posed inverse problems on the sphere by sparse regularization, exploiting sparsity in both axisymmetric and directional... 
Wavelet transforms | Dictionaries | spheres | rotation group | Inverse problems | Wigner transform | sampling | Harmonic analysis | Image reconstruction | Manganese | NEEDLETS | SIGNALS | ALGORITHMS | COMPUTER SCIENCE, ARTIFICIAL INTELLIGENCE | DIRECTIONAL WAVELETS | ENGINEERING, ELECTRICAL & ELECTRONIC | SCHEME | SAMPLING THEOREM | FULL-SKY | CURVELETS | TRANSFORMS | Usage | Chemical properties
Journal Article
Journal of Micro Nanolithography MEMS and MOEMS, ISSN 1932-5150, 07/2009, Volume 8, Issue 3, pp. 033002 - 0330010
Journal Article
Proceedings of SPIE, ISSN 0277-786X, 10/2008, Volume 7122, Issue 1, pp. 71220Q - 71220Q-11
For keeping pace with Moore's Law of reducing the feature sizes on integrated circuits, the driving forces have been reductions in the exposure-tool... 
Printability verification | Etch | Dual patterning | DPT | LRC | Overlay | Double patterning
Conference Proceeding
Proceedings of SPIE, ISSN 0277-786X, 06/2003, Volume 5040, Issue 1, pp. 408 - 419
The 65nm device generation will require steady improvements in lithography scanners, resists, reticles and OPC technology. 193nm high NA scanners and... 
Conference Proceeding
12/1987, 4
A coating comprising aluminum and at least one of the transition metals of the groups IVB, VB and VIB are prepared comprising a unique microstructure which may... 
METALLURGY | PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS | APPARATUS THEREFOR | ELECTROFORMING | CHEMISTRY | ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
Patent
06/1986, 4
A coating comprising aluminum and at least one of the transition metals of the groups IVB, VB and VIB are prepared comprising a unique microstructure which may... 
METALLURGY | PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS | APPARATUS THEREFOR | ELECTROFORMING | CHEMISTRY | ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
Patent
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 3/2017, Volume 10143, pp. 101430I - 101430I-12
In 5nm node, even minor process variation in extreme ultraviolet lithography (EUVL) can bring significant impact to the device performance. Except for the... 
EUV resist model | Stochastic model | Line width roughness | Mask 3D effects | CD uniformity | Overlay error | interconnect resistance
Conference Proceeding
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