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materials science, multidisciplinary (30) 30
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Key Engineering Materials, ISSN 1013-9826, 07/2016, Volume 701, pp. 77 - 82
Simultaneous thermal oxidation and nitridation technique was utilized to transform sputtered Zr to stoichiometric ZrO2 thin films on Si substrate. The... 
Oxide | Angle-resolved | Nitrogen | Thin film
Journal Article
Applied Physics A, ISSN 0947-8396, 10/2016, Volume 122, Issue 10, pp. 1 - 9
Indium hydroxide (In(OH)3) nanoparticles were synthesized at various pH values (8–11) by co-precipitation method. Its properties were characterized by X-ray... 
Condensed Matter Physics | Operating Procedures, Materials Treatment | Optical and Electronic Materials | Characterization and Evaluation of Materials | Surfaces and Interfaces, Thin Films | Physics | Nanotechnology
Journal Article
Journal of Alloys and Compounds, ISSN 0925-8388, 09/2011, Volume 509, Issue 35, pp. 8728 - 8737
Formation of ZrO by simultaneous thermal oxidation and nitridation in nitrous oxide of sputtered Zr on Si substrate is reported here for the first time.... 
Metal-oxide-semiconductor | Sputtered Zr | Nitrous oxide | Oxidation | Nitridation | OXIDE | ZRO2/SI | GATE DIELECTRICS | MATERIALS SCIENCE, MULTIDISCIPLINARY | METALLURGY & METALLURGICAL ENGINEERING | SILICON | OPTICAL-PROPERTIES | CHEMISTRY, PHYSICAL | HIGH-K DIELECTRICS | ELECTRICAL CHARACTERISTICS | METAL | ATOMIC LAYER DEPOSITION
Journal Article
Journal of Materials Science: Materials in Electronics, ISSN 0957-4522, 8/2018, Volume 29, Issue 15, pp. 12888 - 12898
Journal Article
Applied Physics A: Materials Science & Processing, ISSN 0947-8396, 08/2017, Volume 123, Issue 8, p. 1
To access, purchase, authenticate, or subscribe to the full-text of this article, please visit this link: http://dx.doi.org/10.1007/s00339-017-1122-z A study... 
Thin films | Analysis | Crystals | Oxidation-reduction reaction | Dielectric films | Electron microscopy | Structure | Mechanical engineering | Electric properties
Journal Article
Materials Letters, ISSN 0167-577X, 08/2013, Volume 105, pp. 72 - 75
Journal Article
Journal of Alloys and Compounds, ISSN 0925-8388, 10/2017, Volume 722, pp. 729 - 739
Journal Article
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, ISSN 0957-4522, 10/2010, Volume 21, Issue 10, pp. 980 - 993
In the advancement of metal-oxide-semiconductor technology, Si-based semiconductor, with SiO2 as outstanding dielectric, has been dominating microelectronic... 
PHYSICS, CONDENSED MATTER | PHYSICS, APPLIED | MATERIALS SCIENCE, MULTIDISCIPLINARY | BAND OFFSETS | ELECTRICAL-PROPERTIES | KAPPA-GATE DIELECTRICS | HIGH-K DIELECTRICS | ZIRCONIUM-OXIDE FILMS | THERMAL-OXIDATION | ENGINEERING, ELECTRICAL & ELECTRONIC | PULSED-LASER DEPOSITION | HFO2 FILMS | CATHODIC ARC DEPOSITION | ATOMIC LAYER DEPOSITION
Journal Article
Applied Surface Science, ISSN 0169-4332, 11/2017, Volume 423, pp. 236 - 244
Journal Article
JOURNAL OF MATERIALS RESEARCH, ISSN 0884-2914, 11/2013, Volume 28, Issue 21, pp. 2985 - 2989
Electrical properties of ZrO2 formed by simultaneous oxidation and nitridation of sputtered Zr thin films on Si have been systematically investigated. Various... 
NITRIDATION | GATE DIELECTRICS | DEPOSITION | MATERIALS SCIENCE, MULTIDISCIPLINARY | GROWTH | ZR THIN-FILM | BAND DIAGRAM | GAS | METAL | THERMAL-OXIDATION | Studies | Oxidation | Materials research | Semiconductors | Dielectric properties | Analysis
Journal Article
Materials Letters, ISSN 0167-577X, 06/2019, Volume 245, p. 174
In this paper, the effect of post deposition annealing (PDA) on the chemical, structural, and electrical properties of the high-k... 
Annealing | Silicon carbide | Transmission electron microscopes | Analysis | X-ray spectroscopy | Mechanical engineering | Electric properties
Journal Article
Materials Letters, ISSN 0167-577X, 06/2019, Volume 245, pp. 174 - 177
In this paper, the effect of post deposition annealing (PDA) on the chemical, structural, and electrical properties of the high-k Y O /Al O stacking dielectric... 
Post-deposition anneal | stacking dielectric | Y | XPS | XRD | Al | HRTEM | O
Journal Article
International Journal of Thermal Sciences, ISSN 1290-0729, 01/2015, Volume 87, pp. 169 - 177
Journal Article