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The Canadian Journal of Chemical Engineering, ISSN 0008-4034, 04/2017, Volume 95, Issue 4, pp. 708 - 716
Journal Article
Optics and Laser Technology, ISSN 0030-3992, 02/2018, Volume 99, pp. 310 - 314
•Studying aging effect of AlF3 coating material by resistive heating method from more aspects.•Different characterization methods were combined to analyze the... 
Characterization | AlF3 coatings | Aging effect | Resistive heating method | 193 nm lithography | Scattering and absorption | coatings | AlF | MGF2 | PHYSICS, APPLIED | CONSTANTS | SINGLE | ULTRAVIOLET OPTICAL-PROPERTIES | MULTILAYER | MIRRORS | REGION | REFLECTANCE | FLUORIDE THIN-FILMS | OPTICS | FREE-ELECTRON LASERS
Journal Article
Optik (Stuttgart), ISSN 0030-4026, 2018, Volume 156, pp. 635 - 645
Accurate optics-based dimensional measurements of features sized well-below the diffraction limit require a thorough understanding of the illumination within... 
Optical microscopy | Scatterfield microscopy | Angle-resolved illumination | Bi-telecentric system | 193 nm microscopy | Lens system design | 193 nm microscopy | OPTICS
Journal Article
Optical engineering, ISSN 0091-3286, 12/2012, Volume 51, Issue 12, pp. 121803 - 121803
...Absorption measurement of highreflectance coated mirrors at 193 nm with a Shack – Hartmann wavefront sensor Byungil Cho Edward J. Danielewicz J. Earl Rudisill... 
excimer laser coatings | wavefront distortion | oxide | high-reflectance mirror | photothermal absorption measurement | fluoride | 193 nm | Shack-Hartmann wavefront sensor | Oxide | Fluoride | Excimer laser coatings | High-reflectance mirror | Wavefront distortion | Photothermal absorption measurement | OPTICS
Journal Article
JOURNAL OF APPLIED PHYSICS, ISSN 0021-8979, 08/2014, Volume 116, Issue 8, p. 83711
In past studies, we have observed copious emissions of ionic and atomic Zn from single-crystal ZnO accompanying irradiation of single-crystal ZnO with 193-nm... 
IRRADIATION | PHYSICS, APPLIED | PLASMA | MGO | ELECTRIC-FIELD | POSITIVE-ION EMISSION | FIELD-IONIZATION | ATOMS | ABLATION | Ionization energy | Zinc oxide | Research | Semiconductors | Electric properties | 193 nm excimer laser radiation | single-crystal ZnO | Zn Rydberg
Journal Article
Optics Communications, ISSN 0030-4018, 07/2013, Volume 298-299, pp. 171 - 175
... (e.g., in lenses, prisms, etc.) to suppress undesirable reflections. So the AR coatings for P-polarized 193 nm laser beam at an incidence angle of 74... 
P-polarized | 193 nm | Antireflection (AR) coating | Large incidence angles
Journal Article
Journal of Photopolymer Science and Technology, ISSN 0914-9244, 2010, Volume 23, Issue 1, pp. 11 - 18
... lithography in a straightforward and process-friendly manner. In this paper, we discuss several integration strategies which allow 193 nm immersion lithography to produce suitable topographical and chemical guiding patterns for DSA... 
DSA | 193 nm lithography | Graphoepitaxy | Chemical epitaxy | Immersion lithography | Block copolymers | Directed self-assembly | THIN-FILMS | block copolymers | POLYMER SCIENCE | immersion lithography | BLOCK-COPOLYMERS | OPTICAL LITHOGRAPHY | LAYERS | chemical epitaxy | DENSITY | graphoepitaxy | directed self-assembly | MEDIA | Self assembly | Patterning | State of the art | Lithography | Doors | Strategy | Immersion | Polymers | Photopolymers
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2008, Volume 6923
Conference Proceeding
Journal of photopolymer science and technology, ISSN 0914-9244, 2014, Volume 27, Issue 4, pp. 497 - 501
.... As a result, the optical density at 193 nm of the exo isomer polymer is substantially lower since less olefinic polymer end groups were formed... 
Norbornene | endo | 193 nm | exo | transparency | Endo | Exo | Transparency 193 nm | POLYMERS | POLYMER SCIENCE | ADDITION POLYMERIZATION | STEREOCHEMISTRY | CHAIN TRANSFER
Journal Article
Polymers for Advanced Technologies, ISSN 1042-7147, 02/2006, Volume 17, Issue 2, pp. 122 - 130
Recently 193 nm immersion lithography is considered the most promising next generation technology which will enable a 45... 
leaching | refractive index | 193 nm immersion lithography | photoresists | imaging | Photoresists | 193 nm immersion lithography | Leaching | Imaging | Refractive index | 193nm immersion lithography | POLYMER SCIENCE
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2009, Volume 7273
...) for 193 nm immersion lithography. Polynorbornene sulfone films on silicon wafers have been irradiated with 193 nm photons in the absence of a photo-acid generator... 
193 nm immersion lithography | Polysulfone | Non-chemically amplified resists | Non-CAR
Conference Proceeding
Journal of photopolymer science and technology, ISSN 0914-9244, 2004, Volume 17, Issue 4, pp. 587 - 601
This paper reviews the current status and future outlook of materials for 193 nm immersion lithography, with special focus on top barrier layers, photoresists, bottom antireflective coatings... 
flavored water | immersion lithography | 193 nm lithography | antireflecting coating | PHOTORESIST | 193 mn lithography | POLYMER SCIENCE | FILM | DIFFUSION | WATER
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2009, Volume 7273
...) of the imaging system and decrease the minimum printable feature size. Water has been used in first generation immersion lithography at 193 nm to reach the 45 nm node... 
nanoparticle | High refractive index | Immersion lithography | 193 nm lithography | Hafnia (HfO | Photoresist
Conference Proceeding
Journal of The American Society for Mass Spectrometry, ISSN 1044-0305, 9/2017, Volume 28, Issue 9, pp. 1823 - 1826
Journal Article
Journal of Photopolymer Science and Technology, ISSN 0914-9244, 2004, Volume 17, Issue 4, pp. 587 - 601
Journal Article
Chinese Journal of Chemical Physics, ISSN 1674-0068, 02/2019, Volume 32, Issue 1, pp. 129 - 133
In the one-color experiment at 193 nm, we studied the photodissociation of Si-2(+) ions prepared by two-photon ionization using the time-sliced ion velocity map imaging method. The Si... 
Photodissociation | 193 nm | Silicon dimmer Si | Slice imaging | LYING ELECTRONIC STATES | PHOTOIONIZATION | ABSORPTION-SPECTRUM | PHYSICS, ATOMIC, MOLECULAR & CHEMICAL | THEORETICAL PREDICTION | SI2 | POTENTIAL CURVES | Silicon dimmer Si-2 | EXCITED-STATES
Journal Article
Journal of Photopolymer Science and Technology, ISSN 0914-9244, 2007, Volume 20, Issue 3, pp. 345 - 352
Journal Article
Optics Express, ISSN 1094-4087, 07/2009, Volume 17, Issue 15, pp. 12523 - 12531
We report about a thermal regeneration of fiber Bragg gratings written in photosensitive fibers with nanosecond laser pulses. We observe a regenerative process... 
LASER-PULSES | OPTICAL-FIBERS | OPTICS | DECAY | 193 NM | INDEX CHANGES
Journal Article
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