X
Search Filters
Format Format
Format Format
X
Sort by Item Count (A-Z)
Filter by Count
Journal Article (7990) 7990
Conference Proceeding (636) 636
Publication (373) 373
Newspaper Article (274) 274
Dissertation (110) 110
Book Chapter (108) 108
Book Review (33) 33
Magazine Article (13) 13
Newsletter (10) 10
Book / eBook (9) 9
Trade Publication Article (7) 7
Government Document (5) 5
Data Set (1) 1
Paper (1) 1
more...
Subjects Subjects
Subjects Subjects
X
Sort by Item Count (A-Z)
Filter by Count
atomic layer deposition (6294) 6294
materials science, multidisciplinary (3089) 3089
physics, applied (2686) 2686
atomschichtabscheidung (1969) 1969
atomic layer epitaxy (1704) 1704
thin films (1638) 1638
chemistry, physical (1635) 1635
nanoscience & nanotechnology (1540) 1540
physics, condensed matter (1357) 1357
deposition (1256) 1256
aluminum oxide (1093) 1093
growth (1009) 1009
thin-films (993) 993
chemistry, multidisciplinary (953) 953
materials science, coatings & films (850) 850
films (838) 838
silicon (771) 771
atomic-layer-deposition (750) 750
ald (721) 721
nanoparticles (681) 681
zinc oxide (662) 662
oxide (575) 575
titanium dioxide (574) 574
temperature (568) 568
dielectric films (561) 561
chemical-vapor-deposition (555) 555
engineering, electrical & electronic (549) 549
dünnfilm (546) 546
electrodes (523) 523
electrochemistry (514) 514
nanostructure (510) 510
al2o3 (509) 509
oxidation (507) 507
performance (494) 494
nanotechnology (487) 487
materials science (474) 474
tio2 (468) 468
analysis (459) 459
chemical vapor deposition (450) 450
dielectrics (421) 421
annealing (417) 417
photovoltaic cells (415) 415
precursors (406) 406
substrates (406) 406
chemistry (405) 405
coatings (371) 371
atomic force microscopy (363) 363
fabrication (361) 361
energy & fuels (351) 351
catalysts (346) 346
stability (344) 344
titan-oxid (337) 337
catalysis (328) 328
zno (328) 328
solar cells (325) 325
oxides (317) 317
devices (313) 313
hafnium oxide (313) 313
organic chemistry (309) 309
transistors (306) 306
passivation (301) 301
atomic structure (298) 298
graphene (297) 297
electric properties (296) 296
aluminiumoxid (291) 291
water (291) 291
oxid (278) 278
surface (278) 278
index medicus (277) 277
nanostructures (270) 270
semiconductors (269) 269
epitaxy (265) 265
optical properties (265) 265
platinum (263) 263
arrays (262) 262
sauerstoff (261) 261
nanopartikel (258) 258
aluminum (257) 257
optics (256) 256
nanotubes (252) 252
physics (250) 250
oxygen (246) 246
morphology (243) 243
carbon (241) 241
nanowires (241) 241
plasma (241) 241
thickness (241) 241
semiconductor devices (235) 235
silicon dioxide (232) 232
hydrogen (231) 231
optical-properties (230) 230
adsorption (228) 228
copper (225) 225
condensed matter physics (224) 224
electrical-properties (224) 224
alumina (223) 223
dünnschicht (223) 223
research (222) 222
röntgenphotoelektronenspektroskopie (221) 221
spectroscopy (221) 221
more...
Language Language
Language Language
X
Sort by Item Count (A-Z)
Filter by Count
English (8856) 8856
Chinese (60) 60
Japanese (54) 54
Korean (25) 25
German (17) 17
Swedish (4) 4
French (2) 2
Polish (1) 1
Portuguese (1) 1
Russian (1) 1
more...
Publication Date Publication Date
Click on a bar to filter by decade
Slide to change publication date range


2012, ISBN 3527327975, 473
Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at... 
Chemical vapor deposition | Nanostructured materials | Industrial applications
eBook
Chemistry – A European Journal, ISSN 0947-6539, 08/2017, Volume 23, Issue 45, pp. 10768 - 10772
Identification and synthesis of intramolecularly donor‐stabilized aluminium(III) complexes, which contain a 3‐(dimethylamino)propyl (DMP) ligand, as novel... 
aluminium | gas barrier layers | precursor chemistry | atomic layer deposition | thin films | THIN-FILMS | VAPOR | TEMPERATURE | DIELECTRICS | GROWTH | CHEMISTRY, MULTIDISCIPLINARY | WATER | Films | Aluminum | Volatility | Atomic layer epitaxy | Thermal stability | Aluminum oxide | Thin films | Synthesis | Precursors | Ligands | Coordination compounds | Deposition | Low temperature
Journal Article
2014, 2013, ISBN 1461480531, Volume 9781461480549, 265
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory,... 
Electronics & communications engineering | Semiconductors | Chemical vapor deposition | Electrochemistry | Electronics and Microelectronics, Instrumentation | Chemistry | Memory Structures | Energy Technology | Atomic layer deposition
eBook
Nanotechnology, ISSN 0957-4484, 06/2015, Volume 26, Issue 5, p. 054001
Two new processes for the atomic layer deposition of copper indium sulfide (CuInS2) based on the use of two different sets of precursors are reported. Metal... 
Atomic layer deposition | Copper indium sulfide | Thin film solar cells | PHYSICS, APPLIED | atomic layer deposition | OXIDE | CHEMICAL-VAPOR-DEPOSITION | ENERGY CONVERSION | MATERIALS SCIENCE, MULTIDISCIPLINARY | DECOMPOSITION | NANOSCIENCE & NANOTECHNOLOGY | copper indium sulfide | thin film solar cells | CUXS | GROWTH | ZNS | Chemical Sciences
Journal Article
MRS Bulletin, ISSN 0883-7694, 11/2011, Volume 36, Issue 11, pp. 865 - 871
This article reviews and assesses recent progress in atomic layer deposition (ALD) and highlights how the field of ALD is expanding into new applications and... 
thin film | coating | Atomic layer deposition | blend | composite | POLYMERS | ROUTE | PHYSICS, APPLIED | ETHYLENE-GLYCOL | POLYCHAETE JAWS | DIETHYLZINC | MATERIALS SCIENCE, MULTIDISCIPLINARY | GROWTH | COMPONENT | METAL INFILTRATION | ALUMINA | SURFACE-CHEMISTRY
Journal Article
Coordination Chemistry Reviews, ISSN 0010-8545, 12/2013, Volume 257, Issue 23-24, pp. 3254 - 3270
•Energy-enhanced ALD allows for a wider choice of precursors.•More stable precursors allow for higher deposition temperatures to be reached.•Energy-enhanced... 
Energy-enhanced ALD | Ozone-based ALD | Atomic layer deposition | Plasma-enhanced ALD | Precursors | TTIP | Ti-N-Prime | FT-IR | TMA | RT-ALD | RTP | Ti-Prime | CCP | DMAI | MBE | Thd | DFT | Ti-Star | S-OH | BDEAS | ICP | ALD | 3c2e | GPC | GASEOUS TRIMETHYLALUMINUM | ALUMINUM-OXIDE | CHEMICAL-VAPOR-DEPOSITION | ZNO FILMS | CYCLOPENTADIENYL PRECURSORS | SITU REACTION-MECHANISM | CHEMISTRY, INORGANIC & NUCLEAR | PLASMA-ASSISTED ALD | SURFACE-REACTION MECHANISMS | OXIDE THIN-FILMS | ROOM-TEMPERATURE ALD
Journal Article
by Yang, JJ and Liu, L
ACS APPLIED MATERIALS & INTERFACES, ISSN 1944-8244, 10/2019, Volume 11, Issue 39, pp. 36270 - 36277
The synthesis of large-area and high-quality two-dimensional (2D) MoS2 is undoubtedly a significant challenge till now. In this work, an effective strategy for... 
ROUTE | MONOLAYER MOS2 | atomic layer deposition | MoS2 growth mechanisms | molybdenum pentachloride | MATERIALS SCIENCE, MULTIDISCIPLINARY | NANOSCIENCE & NANOTECHNOLOGY | MOCVD | CVD | grain size | FOAM | GROWTH | WS2 | 2D MoS2 films | THIN-FILM | EFFICIENT
Journal Article
IEEE Electron Device Letters, ISSN 0741-3106, 12/2010, Volume 31, Issue 12, pp. 1449 - 1451
Journal Article
Electrochimica Acta, ISSN 0013-4686, 05/2018, Volume 271, pp. 19 - 26
Journal Article
Chemistry of Materials, ISSN 0897-4756, 07/2011, Volume 23, Issue 14, pp. 3325 - 3334
The thermal chemistry of copper(I)-N,N′-di-sec-butylacetamidinate on Ni(110) single-crystal and cobalt polycrystalline surfaces was characterized under... 
atomic layer deposition | surface chemistry | copper films | amidinate complex | X-ray photoelectron spectroscopy | COORDINATION CHEMISTRY | MECHANISTIC DETAILS | MATERIALS SCIENCE, MULTIDISCIPLINARY | CH3CN | CHEMISTRY, PHYSICAL | DIFFUSION-BARRIERS | AMIDINATE | NICKEL SURFACES | NI SURFACE | METAL-SURFACES | PRECURSORS | THERMAL CHEMISTRY
Journal Article
Applied Surface Science, ISSN 0169-4332, 02/2020, Volume 502, p. 144402
•2-D MoS2 shows layer-dependent friction behaviors, and the friction of MoS2 on oxides (SiO2 or Al2O3) is lower than on Si.•Sulfur defects can lead to the... 
Atomic layer deposition | 2-D MoS2 | Friction control | FRICTION | PHYSICS, CONDENSED MATTER | CONTACT | ENERGY | PHYSICS, APPLIED | WETTABILITY | SEMICONDUCTORS | GRAPHENE | CHEMISTRY, PHYSICAL | LUBRICANT | WEAR | MATERIALS SCIENCE, COATINGS & FILMS
Journal Article
Journal of the Electrochemical Society, ISSN 0013-4651, 2012, Volume 159, Issue 3, pp. H277 - H285
Plasma-assisted atomic layer deposition (ALD) was used to deposit SiO2 films in the temperature range of Tdep = 50–400°C on Si(100). H2Si[N(C2H5)2]2 and an O2... 
ELECTROCHEMISTRY | CHEMICAL-VAPOR-DEPOSITION | OXIDE THIN-FILMS | SILICON SOLAR-CELLS | SURFACE PASSIVATION | ELECTRICAL-PROPERTIES | ATOMIC-LAYER DEPOSITION | REACTION SEQUENCE CHEMISTRY | AL2O3 | LOW-TEMPERATURE | CRYSTALLINE SILICON | MATERIALS SCIENCE, COATINGS & FILMS
Journal Article
The Journal of Physical Chemistry C, ISSN 1932-7447, 06/2018, Volume 122, Issue 25, pp. 13481 - 13491
The thermal chemistry of tris­(2,2,6,6-tetramethyl-3,5-heptanedionato)­ruthenium­(III) (Ru­(tmhd)3), a potential precursor for the chemical deposition of... 
OXIDE | CHEMICAL-VAPOR-DEPOSITION | MECHANISTIC DETAILS | MATERIALS SCIENCE, MULTIDISCIPLINARY | DECOMPOSITION | CHEMISTRY, PHYSICAL | DIFFUSION BARRIER | NANOSCIENCE & NANOTECHNOLOGY | THIN-FILM GROWTH | NOBLE-METALS | COPPER | THERMAL CHEMISTRY | Science & Technology - Other Topics | Chemistry | Materials Science
Journal Article
Langmuir, ISSN 0743-7463, 03/2014, Volume 30, Issue 11, pp. 3254 - 3263
The high CO tolerance of PtRu electrocatalysis, compared with pure Pt and other Pt-based alloys, makes it interesting as an anode material in proton exchange... 
AD-ATOMS | CARBON-MONOXIDE | EPITAXIAL-GROWTH | MATERIALS SCIENCE, MULTIDISCIPLINARY | METHANOL OXIDATION | CHEMISTRY, PHYSICAL | MONOLAYER | CHEMISTRY, MULTIDISCIPLINARY | LIMITED REDOX REPLACEMENT | PLATINUM-RUTHENIUM | ELECTROCATALYSTS | UNDERPOTENTIAL DEPOSITION
Journal Article