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by Collaboration, The LHCb and Jr, A Augusto Alves and Filho, L M Andrade and Barbosa, A F and Bediaga, I and Cernicchiaro, G and Guerrer, G and Jr, H P Lima and Machado, A A and Magnin, J and Marujo, F and Miranda, J M de and Reis, A and Santos, A and Toledo, A and Akiba, K and Amato, S and Paula, B de and Paula, L de and Silva, T da and Gandelman, M and Lopes, J H and Maréchal, B and Moraes, D and Polycarpo, E and Rodrigues, F and Ballansat, J and Bastian, Y and Boget, D and Bonis, I De and Coco, V and David, P Y and Decamp, D and Delebecque, P and Drancourt, C and Dumont-Dayot, N and Girard, C and Lieunard, B and Minard, M N and Pietrzyk, B and Rambure, T and Rospabe, G and T'Jampens, S and Ajaltouni, Z and Bohner, G and Bonnefoy, R and Borras, D and Carloganu, C and Chanal, H and Conte, E and Cornat, R and Crouau, M and Delage, E and Deschamps, O and Henrard, P and Jacquet, P and Lacan, C and Laubser, J and Lecoq, J and Lefèvre, R and Magne, M and Martemiyanov, M and Mercier, M-L and Monteil, S and Niess, V and Perret, P and Reinmuth, G and Robert, A and Suchorski, S and Arnaud, K and Aslanides, E and Babel, J and Benchouk, C and Cachemiche, J-P and Cogan, J and Derue, F and Dinkespiler, B and Duval, P-Y and Garonne, V and Favard, S and Gac, R Le and Leon, F and Leroy, O and Liotard, P-L and Marin, F and Menouni, M and Ollive, P and Poss, S and Roche, A and Sapunov, M and Tocco, L and Viaud, B and Tsaregorodtsev, A and Amhis, Y and Barrand, G and Barsuk, S and Beigbeder, C and Beneyton, R and Breton, D and Callot, O and ...
Journal of Instrumentation, ISSN 1748-0221, 08/2008, Volume 3, Issue 8, pp. S08005 - S08005
Journal Article
by Efremov, A and Lee, J and Kim, J
PLASMA CHEMISTRY AND PLASMA PROCESSING, ISSN 0272-4324, 09/2017, Volume 37, Issue 5, pp. 1445 - 1462
The effects of both CF4/O-2 and Ar/O-2 mixing ratios in three-component CF4 + O-2 + Ar mixture on plasma parameters, densities and fluxes of active species... 
POLYSILICON | PHYSICS, APPLIED | PROBE MEASUREMENTS | Diagnostics | PHYSICS, FLUIDS & PLASMAS | CF4-based plasma | MODEL | Modeling | MIXING-RATIO | DISCHARGES | ENGINEERING, CHEMICAL | FILMS | Reaction kinetics | AR/CF4 | ETCHING CHARACTERISTICS | PROFILE EVOLUTION | INDUCTIVELY-COUPLED PLASMAS
Journal Article
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