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Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2017, Volume 10143
Conference Proceeding
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, ISSN 0914-9244, 2019, Volume 32, Issue 1, pp. 169 - 177
As the industry looks to extend single-expose extreme ultraviolet (EUV) lithography, stochastic effects become a significant concern to enable yield. Multiple... 
EUV resists | EUV single exposure | EUV defectivity | POLYMER SCIENCE | Hardmask | EUV stochastics | Organic chemistry | Patterning | Optimization
Journal Article
Journal of Photopolymer Science and Technology, ISSN 0914-9244, 2017, Volume 30, Issue 5, pp. 599 - 604
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2018, Volume 10810
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2017, Volume 10451
Conference Proceeding
Optics Express, ISSN 1094-4087, 08/2014, Volume 22, Issue 17, pp. 20144 - 20154
A self-contained electro-optical module for scanning extreme ultraviolet (EUV) reflection microscopy at 13.5 nm wavelength has been developed. The system has... 
OPTICS | LASER | LIGHT | EUV
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2018, Volume 10809
Conference Proceeding
Journal of Photopolymer Science and Technology, ISSN 0914-9244, 09/2014, Volume 27, Issue 5, pp. 601 - 610
Journal Article
Geophysical Research Letters, ISSN 0094-8276, 08/2010, Volume 37, Issue 16, p. n/a
Solar activity during 2007–2009 was very low, and during this protracted solar minimum period, the terrestrial thermosphere was cooler and lower in density... 
solar | density | thermosphere | EUV | GEOSCIENCES, MULTIDISCIPLINARY | MESOSPHERE | EUV FLUX | GENERAL-CIRCULATION MODEL | Earth | Climate change | Astrophysics | Atmospheric sciences | Sun | Physics | Astronomy
Journal Article
Journal of Photopolymer Science and Technology, ISSN 0914-9244, 2017, Volume 30, Issue 5, pp. 599 - 604
Extreme ultraviolet (EUV) lithography with reflective photomasks continues to be a potential patterning technology for high volume manufacturing at the seven... 
EUV critical issues | Stochastic effects | EUV lithography | EUV extendibility | POLYMER SCIENCE
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2013, Volume 8679
EUV defectivity has been an important topic of investigation in past years. Today, the absence of a pellicle raises concerns for particle adders on reticle... 
EUV mask infrastructure | Pellicle | EUV | Reticle defect mitigation | Reticles | Feasibility | Imaging
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2009, Volume 7271
On the road to insertion of extreme ultraviolet (EUV) lithography into production at the 16 nm technology node and below, we are testing its integration into... 
Extreme ultraviolet lithography | EUV resist process | EUV OPC | EUV device integration | EUVL | EUV mask
Conference Proceeding
Optical Engineering, ISSN 0091-3286, 10/2019, Volume 58, Issue 10, pp. 107102 - 107102
Extreme ultraviolet lithography (EUVL) is recognized as a leading technology in next-generation lithography. Achieving spectral purification while ensuring... 
deposition model | EUV reflectance | OPTICS | multilayer coating profile | coating defects | EUV collector with grating | LITHOGRAPHY
Journal Article
Journal of Photopolymer Science and Technology, ISSN 0914-9244, 2017, Volume 30, Issue 5, pp. 613 - 617
In the last years, the continuous efforts on the development of extreme ultraviolet (EUV) lithography has allowed to push the lithographic performance of the... 
EUV substrate | EUV resist sensitivity | EUVL | Low exposure dose EUV resist | POLYMER SCIENCE
Journal Article
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