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ACS Nano, ISSN 1936-0851, 02/2012, Volume 6, Issue 2, pp. 1494 - 1502
Although step-and-flash imprint lithography, or S-FIL, has brought about tremendous advancement in wafer-scale fabrication of sub-100 nm features of... 
THIN-FILMS | metal oxides | LINEWIDTH | MATERIALS SCIENCE, MULTIDISCIPLINARY | nanofabrication | CHEMISTRY, PHYSICAL | NANOSCIENCE & NANOTECHNOLOGY | CROSS-LINKERS | CHEMISTRY, MULTIDISCIPLINARY | step-and-flash nanoimprint lithography | GRATINGS | NANOIMPRINT LITHOGRAPHY | SOL | nanolithography | TEMPERATURE | CONDUCTIVITY | RESISTS | FABRICATION
Journal Article
MRS Bulletin, ISSN 0883-7694, 9/2008, Volume 33, Issue 9, pp. 854 - 863
Imprint lithography has a remarkable patterning resolution of less than 5 nm, and it is simultaneously capable of patterning over large areas with long-range... 
PHYSICS, APPLIED | STEP | FABRICATION | MATERIALS SCIENCE, MULTIDISCIPLINARY | NANOTOPOGRAPHY
Journal Article
Advanced Materials, ISSN 0935-9648, 09/2008, Volume 20, Issue 17, pp. 3308 - 3313
Functionalized, thiol‐ene nanopatterned materials are fabricated using step and flash imprint lithography (SFIL) and are readily modified with a... 
polymerization | nanoimprint lithography | thiol‐ene | polymeric materials | PHYSICS, CONDENSED MATTER | PHYSICS, APPLIED | MECHANISM | BEHAVIOR | MATERIALS SCIENCE, MULTIDISCIPLINARY | SIZE | CHEMISTRY, PHYSICAL | PHOTOPOLYMERIZATION | NANOSCIENCE & NANOTECHNOLOGY | POLYMERIZATION | CHEMISTRY, MULTIDISCIPLINARY | FEATURES | FILMS | FORMULATIONS | CHEMISTRY
Journal Article
Journal Article
ACS Nano, ISSN 1936-0851, 05/2010, Volume 4, Issue 5, pp. 2561 - 2568
Journal Article
Microelectronic Engineering, ISSN 0167-9317, 03/2014, Volume 116, pp. 44 - 50
[Display omitted] •A strong adhesion force in nanoimprint was demonstrated to avoid pattern peeling.•An adhesion force between resist and underlayer in UV... 
Nanoimprint materials | Step-and-flash imprint lithography | Adhesion force between resist and underlayer | High resolution inkjet systems | TRENCHES | PHYSICS, APPLIED | GAP FILL MATERIALS | NANOSCIENCE & NANOTECHNOLOGY | OPTICS | ENGINEERING, ELECTRICAL & ELECTRONIC | Reduction | Adhesive strength | Cationic | Lithography | Resists | Irradiation | Peeling | Fluorination
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2011, Volume 7970
The Jet and Flash Imprint Lithography (J-FIL TM ) process uses drop dispensing of UV curable resists to assist high resolution patterning for subsequent dry... 
Mask | Replication | High contrast mark | Jet and Flash Imprint Lithography | J-FIL
Conference Proceeding
Advanced Materials, ISSN 0935-9648, 02/2007, Volume 19, Issue 4, pp. 495 - 513
Journal Article
ACS Applied Materials & Interfaces, ISSN 1944-8244, 12/2013, Volume 5, Issue 24, pp. 13113 - 13123
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2013, Volume 8880
The next step in the evolution of wafer size is 450mm. Any transition in sizing is an enormous task that must account for fabrication space, environmental... 
template | 450mm | nanoimprint | Jet and Flash Imprint Lithography | J-FIL | Patterning | Lithography | Wafers | Modules | Infrastructure | Metrology | Etching | Devices
Conference Proceeding