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Chemistry of Materials, ISSN 0897-4756, 01/2012, Volume 24, Issue 2, pp. 393 - 401
We report a chemical route to colloidal silicon (Si) nanocrystals, or quantum dots, with widely tunable average diameter, from less than 3 nm up to 90 nm and... 
Scherrer analysis | HSQ | hydrogen silsesquioxane | size determination | X-ray diffraction | transmission electron microscopy | XRD | small-angle X-ray scattering | TEM | SAXS | silicon nanocrystals | MATERIALS SCIENCE, MULTIDISCIPLINARY | LIGHT | HYDROSILYLATION | CHEMISTRY, PHYSICAL | PLASMA SYNTHESIS | QUANTUM DOTS | NANOPARTICLES | LUMINESCENCE | CONFINEMENT | FABRICATION | ABSORPTION
Journal Article
Journal of Photopolymer Science and Technology, ISSN 0914-9244, 2015, Volume 28, Issue 4, pp. 551 - 556
We evaluated the surface states of HSQ with 0.1wt% PDMS additive replica molds fabricated by RT nanoimprinting using SiO2 on Si and PDMS master molds by water... 
HSQ | room temperature nanoimprint | PDMS
Journal Article
IEEE Electron Device Letters, ISSN 0741-3106, 05/2016, Volume 37, Issue 5, pp. 549 - 552
We demonstrate improved performance due to enhanced electrostatic control achieved by diameter scaling and gate placement in vertical InAs-GaSb tunneling... 
Performance evaluation | Fabrication | III-V | TFET | HSQ | Logic gates | Nanowire | Nanoscale devices | InAs-GaSb | Electrostatics | transistor | Elektroteknik och elektronik | Engineering and Technology | Electrical Engineering, Electronic Engineering, Information Engineering | Teknik | nanowire
Journal Article
Personality and Individual Differences, ISSN 0191-8869, 01/2018, Volume 120, pp. 193 - 201
Individual differences in the use of humor are a growing topic in personality research. This paper presents the psychometric analysis of the Spanish version of... 
Personality | Well-being | Anger management | Humor styles | Spanish version | HSQ | PSYCHOMETRIC PROPERTIES | PSYCHOLOGY, SOCIAL | AGREEABLENESS | ADJUSTMENT | DIMENSIONS | VERSION | PEOPLE | SENSE | QUESTIONNAIRE | TRAITS | Wit and humor | Usage | Analysis
Journal Article
Sensors & Actuators: B. Chemical, ISSN 0925-4005, 04/2017, Volume 242, pp. 47 - 55
•A pressure free NIL method using a film-like thin PDMS mold is proposed.•An LSPR bio-sensor substrate holding an Au-capped nano-pillar aaray has been... 
NIL | Immunoassay | LSPR | Biosensor | HSQ | IMPRINT | ELECTROCHEMISTRY | GOLD | CHEMISTRY, ANALYTICAL | INSTRUMENTS & INSTRUMENTATION | REPLICATION | CONSTANTS | Detectors
Journal Article
Optik, ISSN 0030-4026, 12/2019, Volume 199, p. 163333
1D patterns with different periods were fabricated by Electron Beam Direct Write (EBDW) lithography with the aim to improve the Light Emitting Diode (LED)... 
EBDW lithography | HSQ XR 1541 resist | 1D structures | Photonic crystals | LED efficiency | Light extraction enhancement | PHOTONIC CRYSTAL | OPTICS
Journal Article
Journal of Materials Chemistry C, ISSN 2050-7534, 03/2014, Volume 2, Issue 12, pp. 2118 - 2122
A novel, non-chemically amplified negative resist was synthesized and characterized for next generation lithography applications. This resist material was... 
PHYSICS, APPLIED | MATERIALS SCIENCE, MULTIDISCIPLINARY | HSQ
Journal Article
The Journal of Physical Chemistry A, ISSN 1089-5639, 08/2014, Volume 118, Issue 34, pp. 7159 - 7166
The crystal and molecular structure of the 2,3,5,6-tetramethylpyrazine (TMP) complex with 2,5-dibromo-3,6-dihydroxy-p-quinone (bromanilic acid, BRA) has been... 
CHEMISTRY, PHYSICAL | VIBRATIONAL-SPECTRA | TMP | NEUTRON-SCATTERING | HSQ | PHYSICS, ATOMIC, MOLECULAR & CHEMICAL | Tunneling (Physics) | Spectra | Structure | Analysis | Methyl groups
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2013, Volume 8880
Half-pitch (hp) 11 to 7.5nm will be resolution requirement for 3 to 5 years later in lithography technology. In specific, hp16nm in 2015 and hp11nm in 2019 for... 
EB lithography | mold | Nanoimprint lithography | XR-1541 | HSQ | Fogging | Residues | Patterning | Developers | Lithography | Resists | Media | Pillars
Conference Proceeding
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, ISSN 2166-2746, 05/2012, Volume 30, Issue 3
The authors demonstrate generation of high-resolution nanostructures using achromatic spatial frequency multiplication in the extreme ultraviolet wavelength... 
PATTERNS | NANOSCIENCE & NANOTECHNOLOGY | EXTREME | PHYSICS, APPLIED | LITHOGRAPHY | ENGINEERING, ELECTRICAL & ELECTRONIC
Journal Article
Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams, ISSN 1001-4322, 07/2017, Volume 29, Issue 7
Journal Article
2016, ISBN 0081003544, Volume 11
This chapter discusses metal-oxide resists by focusing on two materials—hydrogen silsesquioxane (HSQ) and hafnium peroxide sulfate (HafSOx). Small HSQ and... 
EUV resist | Metal-oxide resist | HafSOx | E-beam resist | HSQ
Book Chapter
Nanotechnology, ISSN 0957-4484, 03/2013, Volume 24, Issue 8, pp. 085603 - 1-9
We report on the technology and growth optimization of GaAs/InAs core/shell nanowires. The GaAs nanowire cores were grown selectively by metal organic vapor... 
IMPRINT LITHOGRAPHY | VAPOR-PHASE EPITAXY | PHYSICS, APPLIED | MATERIALS SCIENCE, MULTIDISCIPLINARY | RESOLUTION | HSQ | NANOSCIENCE & NANOTECHNOLOGY | ALGAAS | ARRAYS | INAS NANOWIRES | GAAS NANOWIRES | CATALYST-FREE GROWTH | FABRICATION | Scanning electron microscopy | Gallium arsenides | Nanocomposites | Gallium arsenide | Shells | Nanostructure | Nanowires | Indium arsenides
Journal Article
IEEE Transactions on Applied Superconductivity, ISSN 1051-8223, 04/2016, Volume 26, Issue 3, pp. 1 - 5
A quantum current standard dual to the Josephson voltage standard has been trumpeted as a primary application for the phenomenon of coherent quantum... 
Resistance | electronbeam lithography | Current measurement | Resists | HSQ | Nanowires | superconductor-insulator transition | Standards | SQUIDs | Superconducting microwave devices
Journal Article
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, ISSN 1071-1023, 05/2012, Volume 30, Issue 3, pp. 03D104 - 03D104-4
Top-gated epitaxial graphene nanoribbon (EGNR) field effect transistors (FETs) were fabricated on epitaxial graphene substrates which demonstrated the opening... 
SiC wafer | Graphene Nanoribbon | Hydrogen-silsesquioxane (HSQ) | NANOSCIENCE & NANOTECHNOLOGY | PHYSICS, APPLIED | RESIST | GROWTH | ENGINEERING, ELECTRICAL & ELECTRONIC
Journal Article
Microelectronic Engineering, ISSN 0167-9317, 09/2016, Volume 163, pp. 105 - 109
Hydrogen silsesquioxane (HSQ) has been used as a negative tone resist in electron beam lithography to define sub-10nm patterns. The spontaneous polymerization... 
Aging effect | Prebaking | Electron beam lithography (EBL) | Hydrogen silsesquioxane (HSQ) | 10 nm wide resist lines | Line edge roughness (LER) | Polymerization | Hydrogen
Journal Article
Europe's Journal of Psychology, ISSN 1841-0413, 08/2016, Volume 12, Issue 3, pp. 434 - 455
The Humor Styles Questionnaire (HSQ; Martin et al., 2003) is one of the most frequently used questionnaires in humor research and has been adapted to several... 
Comic styles | German adaptation | Humor Styles Questionnaire (HSQ) | Factorial invariance | Styles of humorous conduct | Reliability | Factorial validity | comic styles | factorial validity | factorial invariance | reliability | styles of humorous conduct
Journal Article
physica status solidi (a), ISSN 1862-6300, 01/2019, Volume 216, Issue 1, pp. 1800530 - n/a
This work demonstrates hydrogen silsesquioxane (HSQ) etching resistance dependence on substrate. It is found that HSQ is barely etched on SiO2/Si substrate,... 
hydrogen silsesquioxane (HSQ) | inductively coupled plasma (ICP) etching | electron beam lithography (EBL) | self‐bias | self-bias | PHYSICS, CONDENSED MATTER | PHYSICS, APPLIED | MATERIALS SCIENCE, MULTIDISCIPLINARY | Silicon substrates | Inductively coupled plasma | Etching | Ion bombardment | Silicon dioxide | Dependence
Journal Article
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