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Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2013, Volume 8681
Current process tool performances are getting significantly enhanced by the adoption of advanced process correction application such as DoseMapper for CD or... 
DoseMapper | Lithography | In-design metrology | DRC targets integration | DFM | Intrafield metrology | Mask metrology | High order overlay correction | Design engineering | Chips (electronics) | Placement | Process control | Placing | Metrology | Strategy | Sampling
Conference Proceeding
Journal of Micro/Nanolithography, MEMS, and MOEMS, ISSN 1932-5150, 4/2016, Volume 15, Issue 2, pp. 021406 - 021406
The use of different illumination source shapes and multipatterning processes used to generate sub-40-nm images can create image placement errors level to... 
intrafield distortion | photolithography | image placement error | overlay | High-order intrafield overlay | intrafield high order process corrections | MATERIALS SCIENCE, MULTIDISCIPLINARY | NANOSCIENCE & NANOTECHNOLOGY | high-order intrafield overlay | OPTICS | ENGINEERING, ELECTRICAL & ELECTRONIC
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2013, Volume 8681
As device design rule has been made pattern size shrink, overlay control has become one of the most critical issues for semiconductor manufacturing. Advanced... 
WIS | CD-SEM | High-order correction | Overlay | In-die | Dedicated target | TIS | Scanning electron microscopy | Design engineering | Cadmium | Semiconductors | Wafers | Position measurement | Metrology | Devices
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2018, Volume 10584
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2009, Volume 7272
Overlay continues to be one of the key challenges for photolithography in semiconductor manufacturing. It becomes even more challenging due to the continued... 
Overlay sampling | Simulation | Overlay | Field by field correction | High order
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2013, Volume 8681
In preparation for EUV lithography (EUVL) in high volume manufacturing, a preproduction ASML NXE:3100 step-and- scan system was used to assess overlay... 
Pattern placement errors | Lithography | High-order overlay errors | EUV | Mix and match | Polyphenylene ethers | Insertion | Strategy | Error analysis | Masks
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2009, Volume 7272
The tight overlay budgets required for 45nm and beyond make overlay control a very important topic. With the adoption of immersion lithography, the incremental... 
Overlay metrology | Dual stage | Immersion | Residual | Process control | High order
Conference Proceeding
Construction and Building Materials, ISSN 0950-0618, 08/2019, Volume 217, pp. 251 - 264
•A porous ultra-thin overlay (PUTO) was proposed.•High-viscosity asphalt was prepared.•The gradation of PUTO is designed.•The performance of PUTO is verified.... 
Performance verification | Porous ultra-thin overlay | Design gradation | High-viscosity asphalt | Design asphalt mixture | ENGINEERING, CIVIL | CONSTRUCTION & BUILDING TECHNOLOGY | PERFORMANCE | MATERIALS SCIENCE, MULTIDISCIPLINARY | MIX | Infrared spectroscopy
Journal Article
Construction and Building Materials, ISSN 0950-0618, 11/2012, Volume 36, pp. 538 - 548
► Newly overlay UHPFC is able to achieve high bond strength with the NC substrates. ► Sand blasted surface give the best interfacial mechanical bonding in... 
Interfacial bond | Permeability characteristics | Repair material | Surface preparation | Durability | Rehabilitation | Overlay | Ultra high performance fiber concrete | Concrete substrate | MATERIALS SCIENCE, MULTIDISCIPLINARY | ENGINEERING, CIVIL | CONSTRUCTION & BUILDING TECHNOLOGY | BOND STRENGTH | Analysis | Reinforced concrete, Fiber | Permeability
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2009, Volume 7272
To satisfy the tight budget of critical dimension, an immersion exposure process is widely applied to critical layers of the recent advanced devices to... 
Metrology | Immersion | Overlay matching | Grid matching | High order | Overlay control
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2015, Volume 9426
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2009, Volume 7272
Controlling overlay residuals to the lowest possible levels is critical for high yielding mass production success and is one of the most pressing challenges... 
Overlay metrology | Residual | Process control | High order | Scanner calibration
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2012, Volume 8324
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2008, Volume 6922
Conference Proceeding
Tribology International, ISSN 0301-679X, 01/2016, Volume 93, Issue Part B, pp. 687 - 695
Tin-based materials are often used as lead-free overlay for half shell bearings in medium and high speed diesel engines for their high resistance to cavitation... 
Coating | Electroplated | Structure | Journal bearing | DESIGN | ENGINEERING, MECHANICAL | Diesel motor | Internal combustion engine industry | Tribology | Multilayers | Diesel engines | Monolayers | High speed | High resistance | Cavitation | Bearing
Journal Article
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