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materials science, multidisciplinary (43) 43
physics, applied (42) 42
nanoscience & nanotechnology (39) 39
lithographic (38) 38
optics (27) 27
lithography (26) 26
engineering, electrical & electronic (25) 25
polymer science (24) 24
lithographie (21) 21
chemistry, physical (20) 20
nanotechnology (18) 18
fabrication (17) 17
resists (15) 15
lithographic performance (14) 14
printing (14) 14
nanostructure (13) 13
silicon (13) 13
physics, condensed matter (12) 12
polymers (12) 12
chemistry, multidisciplinary (11) 11
index medicus (11) 11
mathematical models (11) 11
photolack (11) 11
arrays (10) 10
lithographic fabrication (10) 10
polymer (10) 10
instruments & instrumentation (9) 9
lenses (9) 9
lithographic tools (9) 9
aberration (8) 8
algorithms (8) 8
nanoparticles (8) 8
photoresist (8) 8
poly (8) 8
polymerization (8) 8
resist (8) 8
resolution (8) 8
stability (8) 8
analysis (7) 7
decomposition (7) 7
earth sciences (7) 7
etching (7) 7
gratings (7) 7
lithographic printing (7) 7
materials science (7) 7
morphology (7) 7
nanostructures (7) 7
non-lithographic (7) 7
optimization (7) 7
self-assembly (7) 7
study (7) 7
substrates (7) 7
thin-films (7) 7
ultraviolettlithographie (7) 7
design (6) 6
electrodes (6) 6
lithographic techniques (6) 6
nanomaterials (6) 6
nanowires (6) 6
patterning (6) 6
photolithographie (6) 6
photopolymerization (6) 6
photoresists (6) 6
polymerisation (6) 6
research (6) 6
resins (6) 6
simulation (6) 6
surfaces (6) 6
two-photon absorption (6) 6
alignment (5) 5
chemical amplification (5) 5
chemistry (5) 5
circuits (5) 5
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deposition (5) 5
earth science (5) 5
engineering, manufacturing (5) 5
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inks (5) 5
integrated circuits (5) 5
issue (5) 5
lasers (5) 5
lithographic limestone (5) 5
lithographic masks (5) 5
lithographic microfabrication (5) 5
lithographic objective (5) 5
lithographic process (5) 5
löslichkeit (5) 5
microfabrication (5) 5
microprocesses (5) 5
microstructure (5) 5
nanocomposites (5) 5
nanolithographie (5) 5
optical design (5) 5
paleontology (5) 5
photolithography (5) 5
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Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2011, Volume 8054
...) technology, which produces simultaneous mode- and current-confinement only by lithography and epitaxial crystal growth... 
High reliability | Oxide-free | Single-mode | VCSEL | Lithographic | Single-polarization | Semiconductor laser | Vertical cavity surface emission lasers | Thermal resistance | Lithography | Apertures | Oxides | Security | Devices | Arrays
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2009, Volume 7275
In this work, we present a novel application of layout printability verification (LPV) to assess the scalability of physical layout components from 32 nm to 28... 
Lithographic printability | Design for manufacturability | Process capability | Computational scaling
Conference Proceeding
Nano Convergence, ISSN 2196-5404, 12/2018, Volume 5, Issue 1, pp. 25 - 9
In this work, ladder-shaped block copolymer structures consisting of parallel bars, bends, and T-junctions are formed inside square confinement. We define... 
Self-assembly | Nanostructures | Graphoepitaxy | Lithographic confinement | Block copolymers | PHYSICS, APPLIED | ARRAY | MATERIALS SCIENCE, MULTIDISCIPLINARY | DEVICE | NANOSCIENCE & NANOTECHNOLOGY | NANOLITHOGRAPHY | TOPOGRAPHICAL TEMPLATES | DENSITY | LITHOGRAPHY | Self assembly | Confinement | Copolymers | Field theory | Bends
Journal Article
Advanced Functional Materials, ISSN 1616-301X, 05/2016, Volume 26, Issue 18, pp. 3146 - 3153
As one of the emerging new transition‐metal dichalcogenides materials, molybdenum ditelluride (α‐MoTe2) is attracting much attention due to its optical and... 
α‐MoTe2 | h‐BN | non‐lithographic | graphene | dual‐gate field effect transistor | non-lithographic | dual-gate field effect transistor | α-MoTe | h-BN | PHYSICS, CONDENSED MATTER | PHYSICS, APPLIED | SPECTROSCOPY | MATERIALS SCIENCE, MULTIDISCIPLINARY | GRAPHENE | CHEMISTRY, PHYSICAL | NANOSCIENCE & NANOTECHNOLOGY | MOTE2 | CHEMISTRY, MULTIDISCIPLINARY | BAND-GAP
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2009, Volume 7379
... for optimal mask patterns. Inverse Lithography Technology (ILT) is becoming one of the strong candidates in 32nm... 
RET | SRAF | OPC | 32nm & below | Lithographic performance | Low-k1 | Mask cost | MEEF | Depth of focus | Inverse lithography technology
Conference Proceeding
IEEE Transactions on Semiconductor Manufacturing, ISSN 0894-6507, 11/2002, Volume 15, Issue 4, pp. 464 - 469
.... with photoresist lithography from the ion implantation process. This new ion implantation technology can reduce the raw process time, footprint, and the cost of ownership to less than one-half that of conventional ion implantation technology... 
Agile manufacturing | Ion implantation | Costs | Lithography | Resists | Implants | Semiconductor device manufacture | Biomembranes | Electrostatics | Ion beams | Implant | Stencil mask Lithographic Ion Implanter (SLIM) | Stencil | PHYSICS, CONDENSED MATTER | PHYSICS, APPLIED | stencil mask Lithographic Ion Implanter (SLIM) | lithography | ENGINEERING, MANUFACTURING | implant | stencil | ENGINEERING, ELECTRICAL & ELECTRONIC | Equipment and supplies | Production processes | Semiconductor industry | Ownership | Semiconductors | Footprints | Photoresists | Devices | Cost engineering
Journal Article
Nanotechnology, ISSN 0957-4484, 05/2019, Volume 30, Issue 21, p. 215202
Even as today's most prominent spin-based qubit technologies are maturing in terms of capability and sophistication, there is growing interest in exploring alternate material platforms... 
PHYSICS, APPLIED | SiGe | QUBIT | SPINS | MATERIALS SCIENCE, MULTIDISCIPLINARY | nanostructure | NANOSCIENCE & NANOTECHNOLOGY | germanium | two-dimensional hole gas | lithographic quantum dot | MATERIALS SCIENCE
Journal Article
by Koo, HS and Chen, M and Kang, CH and Kawa, T
JAPANESE JOURNAL OF APPLIED PHYSICS, ISSN 0021-4922, 06/2008, Volume 47, Issue 6, pp. 4954 - 4957
Nano-particle photo spacers with superior physical characteristics have been fabricated into the defined patterns by lithographic processes in color filter... 
PHYSICS, APPLIED | ALIGNMENT | lithographic process | subpixel cell | photo spacers | photo resist | elastic recovery ratio | color filter
Journal Article
Journal of Micromechanics and Microengineering, ISSN 0960-1317, 10/2009, Volume 19, Issue 10, pp. 105010 - 105010 (8)
Accurate three-dimensional microstructures on silicon or other substrates are becoming increasingly important for optical, electronic, biomedical and medical... 
EYE | INSTRUMENTS & INSTRUMENTATION | PHYSICS, APPLIED | LITHOGRAPHIC FABRICATION | NANOSCIENCE & NANOTECHNOLOGY | MICROSTRUCTURE | ENGINEERING, ELECTRICAL & ELECTRONIC
Journal Article
Microelectronic Engineering, ISSN 0167-9317, 04/2019, Volume 211, pp. 26 - 28
Journal Article
Nanotechnology, ISSN 0957-4484, 04/2017, Volume 28, Issue 20, p. 205304
Journal Article
IUCrJ, ISSN 2052-2525, 2017, Volume 4, Issue Pt 4, pp. 431 - 438
Journal Article
2016 IEEE International Symposium on Circuits and Systems (ISCAS), ISSN 0271-4310, 05/2016, Volume 2016-, pp. 1262 - 1265
In this paper a yield-aware template-based analog layout retargeting methodology for lithography-friendly nanometer technology designs is proposed... 
Integrated circuits | Optical fibers | Solid modeling | spot defect | Layout | Lithography | analog layout retargeting | Resource management | Optimization | lithographic effects | Performance evaluation | Design engineering | CMOS | Circuits | Nanostructure | Design analysis | Defects
Conference Proceeding
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