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Review of scientific instruments, ISSN 1089-7623, 2016, Volume 87, Issue 4, p. 043105
...REVIEW OF SCIENTIFIC INSTRUMENTS 87, 043105 (2016) Low vibration high numerical aperture automated variable temperature Raman microscope Yao Tian, 1,a) Anjan... 
Raman spectra | Numerical aperture | Vanadium oxides | Spectrum analysis | Collection | Microscopes | Phase transitions | Thermal stability | Material properties | CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY | High NA | Cryo Optic | Low vibration | Raman microscope
Journal Article
Journal of non-crystalline solids, ISSN 0022-3093, 07/2015, Volume 419, pp. 27 - 33
Journal Article
Journal of optics (2010), ISSN 2040-8978, 08/2013, Volume 15, Issue 8, pp. 085704 - 1-9
... polarized incident beams. Binary axicons with high numerical aperture (NA) are fabricated in three configurations-axisymmetric and spiral, and bi-axicon-by electron beam lithography... 
high NA binary axicon | linearly and circularly polarized beams | longitudinal E-field component | near-field diffraction | OPTICS | Design engineering | Numerical aperture | Beams (radiation) | Diffraction | Asymmetry | Electron beam lithography | Mathematical analysis | Circularity
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2009, Volume 7227
Rigorous vector analysis of high numerical aperture optical systems encounters severe difficulties... 
Nano-scale | Singular beam | Focusing | High-NA
Conference Proceeding
Journal of Optics, ISSN 2040-8986, 11/2010, Volume 12, Issue 11, pp. 115703 - 115703
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2009, Volume 7274
... 1.35 numerical aperture (NA) ArF immersion lithography. Although it is expected to enable 32 nm hp with either double patterning technology or extreme ultra-violet lithography, there are many problems to be solved with cost reduction... 
High-index immersion technology | ArF lithography | 32 nm half pitch | 1.55 NA
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2012, Volume 8326
Conference Proceeding
Journal Article
Journal of Micro Nanolithography MEMS and MOEMS, ISSN 1932-5150, 10/2006, Volume 5, Issue 3, pp. 033001 - 0330013
.... Polarization aberrations, which are potentially important with hyper-numerical-aperture tools, are a complicated phenomena that refer to induced polarization-dependent wavefront distortions as light... 
optical lithography | Pauli pupil | polarization aberrations | Mueller pupil | Jones pupil | Polarization aberrations | Optical lithography | JONES | IMPACT | OPTICS | HIGH NA | LITHOGRAPHY
Journal Article
by Zhang, FF and Xing, YB and Liao, L and Wang, YB and Xu, HZ and Chen, YS and Dai, NL and Yang, LY and Li, HQ and Li, JY
LASER PHYSICS, ISSN 1054-660X, 07/2019, Volume 29, Issue 7, p. 75106
.... Besides, experimental investigations were carried out to characterize the thermo-optic behavior of an intrinsically single-mode large mode area 20/400 ytterbium-doped fiber with core numerical aperture (NA) similar... 
SILICA FIBER | PHYSICS, APPLIED | INSTABILITY | LASERS | thermal effects | LEAKAGE CHANNEL FIBERS | POWER | AREA | NARROW-LINEWIDTH | fibre amplifier | OPTICS | mode instability | low-numerical aperture (NA) fibre
Journal Article
Journal of micro/nanolithography, MEMS, and MOEMS, ISSN 1932-5150, 10/2017, Volume 16, Issue 4, pp. 041010 - 041010
Current extreme ultraviolet (EUV) projection lithography systems exploit a projection lens with a numerical aperture (NA) of 0.33... 
magnification | overlay | anamorphic | extreme ultraviolet lithography | throughput | exposure tools | imaging | high-NA | MATERIALS SCIENCE, MULTIDISCIPLINARY | EUV | NANOSCIENCE & NANOTECHNOLOGY | ENGINEERING, ELECTRICAL & ELECTRONIC | IMPACT | OPTIMIZATION | OPTICS
Journal Article
Guang xue, jing mi gong cheng, ISSN 1004-924X, 04/2016, Volume 24, Issue 4, pp. 740 - 746
For the manufacture of a lithographic lens with a 45 nm node, this paper focuses on the development of high numerical aperture (NA), deep ultraviolet (DUV... 
Telecentricity | Deep Ultraviolet(DUV)lithographic lens | Optical system design | Curved stop aperture | High Numerical Aperture (NA)lithographic lens | Design engineering | Optical design | Apertures | Projection | Mathematical models | Design analysis | Research and development | Lenses
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2013, Volume 8916
.... However, since some focusing elements, such as focusing lens or parabolic mirrors with finite numerical aperture (NA... 
Optical scatterometry | Optical critical dimension (OCD) metrology | Rigorous coupled-wave analysis (RCWA) | Numerical aperture (NA) | Errors | Numerical aperture | Focusing | Metrology | Mathematical models | Modelling | Incidence | Angle of incidence
Conference Proceeding
Optics and laser technology, ISSN 0030-3992, 2013, Volume 49, pp. 38 - 46
...) method, is an extension of the well-known Thin Element Approximation for tilted geometry, which can be applied to the case of large sample tilts, but it requires the numerical aperture... 
Shape measurement of inclined samples | High NA topography measurement | Digital holographic microscopy | SUPERRESOLUTION | FIELDS | MICROLENSES | DISPLAY | PHYSICS, APPLIED | IMAGE | DIGITAL HOLOGRAPHY | SHAPE MEASUREMENT | OPTICS | Measurement | Algorithms | Analysis | Methods
Journal Article
Japanese journal of applied physics. Pt. 1, Regular papers & short notes, ISSN 0021-4922, 02/2000, Volume 39, Issue 2 B, pp. 962 - 967
Journal Article
Journal of Micro Nanolithography MEMS and MOEMS, ISSN 1932-5150, 10/2002, Volume 1, Issue 3, pp. 188 - 196
Journal Article
Journal of structural biology, ISSN 1047-8477, 2017, Volume 197, Issue 2, pp. 83 - 93
Journal Article
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