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2010, 1. Aufl., Wiley series in pure and applied optics, ISBN 047059697X, xv, 226
A Unified Summary of the Models and Optimization Methods Used in Computational LithographyOptical lithography is one of the most challenging areas of current... 
Microlithography | Integrated circuits | Resolution (Optics) | Semiconductors | Mathematics | Etching | Design and construction | Photolithography | Optical Electronics | Engineering
Book
1979, Graphic arts series, ISBN 9780826927514, 214
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1974, 5th ed., ISBN 0883620057, 1 v. (various pagings)
Book
1989, Proceedings / SPIE--the International Society for Optical Engineering, ISBN 0819401218, Volume 1086., viii, 620
Book
1973, ISBN 9780912920214, xiii, 442
Book
1970, 4th ed. --, 1 v. (various pagings)
Book
1968, Informal report (United States. Naval Oceanographic Office), Volume 68-73., v, 24
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1903, ix, [3], 104, 32 p., [1] leaf of plates
Book
SID Symposium Digest of Technical Papers, ISSN 0097-966X, 05/2018, Volume 49, Issue 1, pp. 1471 - 1474
Advanced four‐mask process a‐Si TFT array manufacturing method and good TFT stability is presented in this paper. We used an optimum half‐tone mask... 
Architecture | Photolithography
Journal Article
2018, Second edition., ISBN 1510616799
"Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical... 
Ultraviolet radiation | Industrial applications | Photolithography | Optical coatings
Web Resource
2018, Second edition., ISBN 1510616799
"Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical... 
Ultraviolet radiation | Industrial applications | Photolithography | Optical coatings
Web Resource
Optics Letters, ISSN 0146-9592, 07/2018, Volume 43, Issue 14, p. 3200
Efficient light coupling to integrated photonic devices is of key importance to a wide variety of applications. “Inverse nanotapers” are widely used, in which... 
Coupling | Photolithography | Photonics
Journal Article
Applied Physics Letters, ISSN 0003-6951, 06/2011, Volume 98, Issue 23, pp. 233101 - 233101-3
Subwavelength electroluminescent sources with spatial, spectral, and polarization controlling capabilities are critical elements for optical imaging and... 
MICROSCOPY | PHOTOLITHOGRAPHY | PHYSICS, APPLIED
Journal Article
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