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Plasma Processes and Polymers, ISSN 1612-8850, 08/2011, Volume 8, Issue 8, pp. 740 - 749
...) plasma assisted metal organic chemical vapour deposition (MOCVD) process using indigenously developed metal organic precursors Yttrium 2,7,7‐trimethyl‐3,5... 
electron cyclotron resonance (ECR) | low‐pressure discharges | oxides | plasma‐enhanced chemical vapor deposition (PECVD) | thin films | low-pressure discharges | plasma-enhanced chemical vapor deposition (PECVD) | Thin films | Flow rate | Precursors | Yttrium oxide | Coatings | Chemical vapor deposition | Deposition | Microwaves
Journal Article
Journal of Crystal Growth, ISSN 0022-0248, 2005, Volume 274, Issue 1, pp. 1 - 5
Undoped and heavily Mg-doped polycrystalline GaN (poly-GaN) films grown on fused silica substrate at 310 °C are investigated by transmission electron... 
A3. Polycrystalline deposition | A1. Crystal structure and morphology | B1. Gallium nitride | A3. Plasma-enhanced CVD | GLASS | EPITAXY | plasma-enhanced | crystal structure and morphology | ULTRAVIOLET PHOTODETECTORS | gallium nitride | CRYSTALLOGRAPHY | polycrystalline deposition
Journal Article
Inorganic Chemistry, ISSN 0020-1669, 11/2003, Volume 42, Issue 22, pp. 7273 - 7282
An amine elimination pathway has been used to produce a number of homo- and heteroleptic zirconium complexes, starting from tetrakis(dialkylamido)zirconium... 
PLASMA-ENHANCED CVD | CHEMICAL-VAPOR-DEPOSITION | MOLECULAR-STRUCTURE | LOW-TEMPERATURE DEPOSITION | CRYSTAL-STRUCTURES | M = ZR | LIGAND | NITRIDE THIN-FILMS | ETHYLENE POLYMERIZATION | AMINE ELIMINATION | CHEMISTRY, INORGANIC & NUCLEAR | Chemical properties | Chemical compounds | Analysis | Organic compounds
Journal Article
Journal of Crystal Growth, ISSN 0022-0248, 2010, Volume 312, Issue 9, pp. 1496 - 1499
The synthesis and characterization of Zn 0.85Cd 0.15O/ZnO multiple quantum wells (MQWs) by remote-plasma-enhanced metalorganic chemical vapor deposition are... 
A3. Multiple quantum well | B2. ZnCdO | A3. Remote-plasma-enhanced MOCVD | Multiple quantum well | CRYSTALLOGRAPHY | ZnCdO | Remote-plasma-enhanced MOCVD | Crystal growth | Diffraction patterns | Energy levels | Synthesis | Quantum wells | Metalorganic chemical vapor deposition | X-rays | Zinc oxide
Journal Article
Surface & Coatings Technology, ISSN 0257-8972, 2003, Volume 169, pp. 281 - 286
With the expectation of getting hard material, we have firstly grown the BON thin film by radio frequency plasma enhanced metal-organic chemical vapor... 
Plasma enhanced MOCVD | Low frequency RF | Hardness | BON film | hardness | CARBON | low frequency RF | MOLECULAR-BEAM EPITAXY | BORON-NITRIDE | plasma enhanced MOCVD | MECHANICAL-PROPERTIES | MATERIALS SCIENCE, COATINGS & FILMS
Journal Article
電子情報通信学会技術研究報告. CPM, 電子部品・材料, ISSN 0913-5685, 05/2007, Volume 107, pp. 67 - 71
横型反応管を用いたリモートプラズマ励起青MOCVD(RPE-MOCVD)によるZnO結晶成長をa面サファイア上に行い、膜厚分布に伴う成長モード変化を明らかにした。ZnOのc軸方向に成長しやすいという特徴を利用して自己形成によるZnOナノロッド及びナノワイヤを作製し、基板温度、成長圧力、原料供給比を様々に変化させること... 
Journal Article
電子情報通信学会技術研究報告. ED, 電子デバイス, ISSN 0913-5685, 05/2007, Volume 107, pp. 67 - 71
横型反応管を用いたリモートプラズマ励起青MOCVD(RPE-MOCVD)によるZnO結晶成長をa面サファイア上に行い、膜厚分布に伴う成長モード変化を明らかにした。ZnOのc軸方向に成長しやすいという特徴を利用して自己形成によるZnOナノロッド及びナノワイヤを作製し、基板温度、成長圧力、原料供給比を様々に変化させること... 
Journal Article
電子情報通信学会技術研究報告. SDM, シリコン材料・デバイス, ISSN 0913-5685, 05/2007, Volume 107, pp. 67 - 71
横型反応管を用いたリモートプラズマ励起青MOCVD(RPE-MOCVD)によるZnO結晶成長をa面サファイア上に行い、膜厚分布に伴う成長モード変化を明らかにした。ZnOのc軸方向に成長しやすいという特徴を利用して自己形成によるZnOナノロッド及びナノワイヤを作製し、基板温度、成長圧力、原料供給比を様々に変化させること... 
Journal Article
Chemical Research in Chinese Universities, ISSN 1005-9040, 10/2003, Volume 19, Issue 4, pp. 383 - 385
The structural and the optical properties of ZnO films with high quality grown via plasma-enhanced metal-organic chemical vapour deposition (MOCVD... 
Substrate | Sapphire | Plasma-enhanced MOCVD | THIN-FILMS | ROOM-TEMPERATURE | plasma-enhanced MOCVD | CHEMISTRY, MULTIDISCIPLINARY | substrate | sapphire
Journal Article
Applied Surface Science, ISSN 0169-4332, 05/2005, Volume 244, Issue 1-4, pp. 385 - 388
Mg Zn O films were successfully grown on a-plane sapphire (112̄0) substrates by remote plasma enhanced metalorganic chemical vapor deposition (RPE-MOCVD). Diethyl zinc (DEZn... 
Bis-Ethylcyclopentadienyl magnesium (EtCp | Stokes shift | Mg | Remote plasma enhanced MOCVD | Diethyl zinc (DEZn) | PHYSICS, CONDENSED MATTER | PHYSICS, APPLIED | MOLECULAR-BEAM EPITAXY | CHEMISTRY, PHYSICAL | remote plasma enhanced MOCVD | BAND-GAP | bis-ethylcyclopentadienyl magnesium (EtCp2Mg) | ALLOY-FILMS | MgxZn1-xO | ZNO | diethyl zinc (DEZn) | MATERIALS SCIENCE, COATINGS & FILMS
Journal Article
Journal of Crystal Growth, ISSN 0022-0248, 01/2007, Volume 298, pp. 468 - 471
Mg Zn O films were successfully grown by remote-plasma-enhanced metalorganic chemical vapor deposition (RPE-MOCVD... 
Zn | A3. Remote-plasma-enhanced MOCVD | B1. Mg | B2. Bis-ethylcyclopentadienyl magnesium | O | MAGNESIUM | EPITAXY | CHEMICAL-VAPOR-DEPOSITION | remote-plasma-enhanced MOCVD | MgxZn1-xO | bis-ethylcyclopentadienyl magnesium | ZNO | CRYSTALLOGRAPHY | REGION
Journal Article
PLASMA PROCESSES AND POLYMERS, ISSN 1612-8850, 08/2011, Volume 8, Issue 8, pp. 740 - 749
...) plasma assisted metal organic chemical vapour deposition (MOCVD) process using indigenously developed metal organic precursors Yttrium 2,7,7-trimethyl-3,5-octanedionates, commonly known as Y(tod)(3... 
YTTRIUM-OXIDE | PHYSICS, CONDENSED MATTER | PHYSICS, APPLIED | POLYMER SCIENCE | oxides | CHEMICAL-VAPOR-DEPOSITION | PHYSICS, FLUIDS & PLASMAS | OPTICAL-PROPERTIES | plasma-enhanced chemical vapor deposition (PECVD) | thin films | GROWTH | low-pressure discharges | electron cyclotron resonance (ECR)
Journal Article
Applied Surface Science, ISSN 0169-4332, 05/2005, Volume 244, Issue 1-4, pp. 381 - 384
Journal Article
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, ISSN 0021-4922, 11/2004, Volume 43, Issue 11 A, pp. 7672 - 7676
Journal Article
Japanese Journal of Applied Physics, Part 2: Letters, ISSN 0021-4922, 08/2004, Volume 43, Issue 8 B, pp. L1088 - L1090
Zn1-xCdxO films were successfully grown by remote plasma-enhanced metalorganic chemical vapor deposition (RPE-MOCVD... 
Optical band gap | Remote plasma-enhanced MOCVD | ZnCdO | Photoluminescence | PHYSICS, APPLIED | MGXZN1-XO | optical band gap | MOLECULAR-BEAM EPITAXY | DEVICES | ALLOY | remote plasma-enhanced MOVCD photoluminescence
Journal Article
Japanese Journal of Applied Physics, Part 2: Letters, ISSN 0021-4922, 11/2004, Volume 43, Issue 11 A, pp. L1452 - L1454
...) a-plane sapphire substrates by remote plasma enhanced metalorganic chemical vapor deposition (RPE-MOCVD... 
Optical band gap | ZnO | Remote plasma-enhanced MOCVD | ZnCdO | Alloys | Photoluminescence | alloys | remote plasma-enhanced MOCVD | PHYSICS, APPLIED | photoluminescence | MGXZN1-XO | optical band gap | MOLECULAR-BEAM EPITAXY | GROWTH | DEVICES | ALLOY
Journal Article
電子情報通信学会技術研究報告. SDM, シリコン材料・デバイス, ISSN 0913-5685, 05/2003, Volume 103, pp. 7 - 12
リモートプラズマMOCVD法により酸素プラズマを用いてジエチル亜鉛(DEZn)からZnOを成長させた。有機原料DEZnのキャリアガスとして水素と窒素を用いた場合、ZnOの成長速度に違いがみられ、水素キャリアを用いた場合に成長速度が大きくなった。また、水素ガス流量とプラズマ酸素流量の割合によっても成長速度が変化した。結晶... 
Journal Article
電子情報通信学会技術研究報告. ED, 電子デバイス, ISSN 0913-5685, 05/2003, Volume 103, pp. 7 - 12
リモートプラズマMOCVD法により酸素プラズマを用いてジエチル亜鉛(DEZn)からZnOを成長させた。有機原料DEZnのキャリアガスとして水素と窒素を用いた場合、ZnOの成長速度に違いがみられ、水素キャリアを用いた場合に成長速度が大きくなった。また、水素ガス流量とプラズマ酸素流量の割合によっても成長速度が変化した。結晶... 
Journal Article
電子情報通信学会技術研究報告. CPM, 電子部品・材料, ISSN 0913-5685, 05/2003, Volume 103, pp. 7 - 12
リモートプラズマMOCVD法により酸素プラズマを用いてジエチル亜鉛(DEZn)からZnOを成長させた。有機原料DEZnのキャリアガスとして水素と窒素を用いた場合、ZnOの成長速度に違いがみられ、水素キャリアを用いた場合に成長速度が大きくなった。また、水素ガス流量とプラズマ酸素流量の割合によっても成長速度が変化した。結晶... 
Journal Article
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