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Rock Mechanics and Rock Engineering, ISSN 0723-2632, 7/2013, Volume 46, Issue 4, pp. 657 - 681
Journal Article
Earth-Science Reviews, ISSN 0012-8252, 09/2014, Volume 136, pp. 202 - 225
Journal Article
Optics Express, ISSN 1094-4087, 2004, Volume 12, Issue 8, pp. 1622 - 1631
We report the fabrication and accurate measurement of propagation and bending losses in single-mode silicon waveguides with submicron dimensions fabricated on... 
CIRCUITS | OPTICS | ROUGHNESS | SIZE
Journal Article
IEEE Transactions on Visualization and Computer Graphics, ISSN 1077-2626, 01/2017, Volume 23, Issue 5, p. 1428
We introduce analytic approximations for accurate real-time rendering of surfaces lit by non-occluded area light sources. Our solution leverages the Irradiance... 
Surface roughness
Journal Article
IEEE Electron Device Letters, ISSN 0741-3106, 01/2016, Volume 37, Issue 1, p. 70
  In this letter, we demonstrate high-performance AlGaN/GaN Schottky barrier diodes (SBDs) on Si substrate with a recessed-anode structure for reduced turn-on... 
Surface roughness
Journal Article
Microelectronic Engineering, ISSN 0167-9317, 04/2018, Volume 190, pp. 33 - 37
Most scanning electron microscope (SEM) measurements of pattern roughness today produce biased results, combining the true feature roughness with noise from... 
PSD | Stochastic-induced roughness | Linewidth roughness | LWR | CD-SEM | LER | Power spectral density | Line-edge roughness | PHYSICS, APPLIED | NANOSCIENCE & NANOTECHNOLOGY | OPTICS | ENGINEERING, ELECTRICAL & ELECTRONIC | Measurement | Scanning electron microscopy | Bias | Roughness | Metrology | Surface roughness | Noise measurement | Edge detection
Journal Article
Jpn J Appl Phys, ISSN 0021-4922, 1/2013, Volume 52, Issue 1, pp. 010002 - 010002-14
Extreme ultraviolet (EUV) radiation, the wavelength of which is 13.5 nm, is the most promising exposure source for next-generation semiconductor lithography.... 
CHEMICALLY AMPLIFIED RESISTS | PHYSICS, APPLIED | WIDTH ROUGHNESS | PATTERN COLLAPSE | LINEWIDTH ROUGHNESS | EUV RESIST | PHOTORESISTS | ACID GENERATION EFFICIENCY | LATENT IMAGE QUALITY | LINE-EDGE ROUGHNESS | 22 NM FABRICATION | Wavelengths | Semiconductors | Lithography | Tradeoffs | Resists | Roughness | Exposure | Ultraviolet
Journal Article
Optics Letters, ISSN 0146-9592, 07/2003, Volume 28, Issue 13, pp. 1150 - 1152
Rib microwaveguides are demonstrated on silicon-on-insulator substrates with Si film thickness of either 380 or 200 nm and a width of 1 mum. Corner mirrors... 
ROUGHNESS | OPTICS
Journal Article
Journal of Applied Crystallography, ISSN 1600-5767, 02/2017, Volume 50, Issue 1, pp. 184 - 191
Neutron supermirrors (SMs), the major components of neutron optical devices, are depth‐graded d ‐spacing multilayers of several hundreds to several thousands... 
roughness replication | resonant diffuse scattering | neutron supermirrors | Neutron supermirrors | X-RAY REFLECTION | INTERFACIAL ROUGHNESS | GROWTH | SURFACE | CRYSTALLOGRAPHY | CHEMISTRY, MULTIDISCIPLINARY | SCATTERING | MULTILAYERS | MIRRORS | Neutrons | Surface roughness | X rays | Crystallography | Correlation | Parameters | Correlation analysis | Scattering | Roughness | Detectors | Interface roughness | Reflectance
Journal Article
Proceedings of SPIE, ISSN 0277-786X, 09/2004, Volume 5494, Issue 1, pp. 459 - 467
HyDRa is a hydrodynamic radial polishing tool ideal for the corrective lapping and fine polishing of diverse materials by means of an accelerated abrasive... 
Roughness
Conference Proceeding
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