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Journal of Photopolymer Science and Technology, ISSN 0914-9244, 11/2016, Volume 29, Issue 6, p. 797
The problem of stochastics in photoresist patterning is gaining increased attention. Understanding this problem requires new modeling methods. Here we describe... 
Amplification | Resists
Journal Article
1988, ISBN 9780944142097, 64
Book
Chemistry of Materials, ISSN 0897-4756, 07/2006, Volume 18, Issue 15, pp. 3404 - 3411
This paper describes a series of photoresists constructed from glass-forming, low-molecular-weight organic compounds, also known as molecular glasses. Compared... 
NEGATIVE RESIST | CHEMICALLY AMPLIFIED RESIST | AMPLIFICATION | MATERIALS SCIENCE, MULTIDISCIPLINARY | DENDRIMER | CHEMISTRY, PHYSICAL | SCANNING PROBE LITHOGRAPHY | WEIGHT ORGANIC RESISTS | MATERIAL ORIGIN | LINE-EDGE ROUGHNESS | NANOMETER LITHOGRAPHY | TONE RESISTS
Journal Article
Chemical Society reviews, ISSN 0306-0012, 08/2017, Volume 46, Issue 16, pp. 4855 - 4866
Continuous ongoing development of dense integrated circuits requires significant advancements in nanoscale patterning technology. As a key process in... 
Journal Article
Chemical Society Reviews, ISSN 0306-0012, 8/2017, Volume 46, Issue 16, pp. 4855 - 4866
Continuous ongoing development of dense integrated circuits requires significant advancements in nanoscale patterning technology. As a key process in... 
PHOTORESISTS | CHEMISTRY, MULTIDISCIPLINARY | MOLECULAR GLASS RESISTS | LITHOGRAPHY
Journal Article
Jpn J Appl Phys, ISSN 0021-4922, 1/2013, Volume 52, Issue 1, pp. 010002 - 010002-14
Extreme ultraviolet (EUV) radiation, the wavelength of which is 13.5 nm, is the most promising exposure source for next-generation semiconductor lithography.... 
CHEMICALLY AMPLIFIED RESISTS | PHYSICS, APPLIED | WIDTH ROUGHNESS | PATTERN COLLAPSE | LINEWIDTH ROUGHNESS | EUV RESIST | PHOTORESISTS | ACID GENERATION EFFICIENCY | LATENT IMAGE QUALITY | LINE-EDGE ROUGHNESS | 22 NM FABRICATION | Wavelengths | Semiconductors | Lithography | Tradeoffs | Resists | Roughness | Exposure | Ultraviolet
Journal Article
2016, ISBN 0081003544, Volume 11
As the challenges of next generation lithography have increased it has become increasingly difficult to maintain progress with traditional photoresists. A... 
High-absorbance resists | Low-absorbance resists | Nanoparticle resist | Novel EUV resists | Metal oxide resist
Book Chapter
Journal of The Institute of Electrical Engineers of Japan, ISSN 1881-4190, 01/2008, Volume 128, Issue 10, pp. 681 - 683
Journal Article
IEEE Transactions on Information Theory, ISSN 0018-9448, 7/2019, pp. 1 - 1
This paper studies the low-SNR regime performance of a scalar complex K-user interference channel with Gaussian noise. The finite bandwidth case is considered,... 
Google | Protocols | Computational modeling | Cryptography | Advertising | Resists
Journal Article
Chemistry of Materials, ISSN 0897-4756, 03/2017, Volume 29, Issue 5, pp. 1898 - 1917
The semiconductor industry has already entered the sub-10 nm region, which has led to the development of cutting-edge fabrication tools. However, there are... 
HIGH-PERFORMANCE | MOLECULAR RESISTS | LITHOGRAPHY RESIST | HYDROGEN SILSESQUIOXANE | MATERIALS SCIENCE, MULTIDISCIPLINARY | HIGH-RESOLUTION | C-60-CONTAINING POLYMERS | LOW-VOLTAGE | CHEMISTRY, PHYSICAL | NANOSTRUCTURES | SILK FIBROIN | ROUGHNESS
Journal Article
POLYMER JOURNAL, ISSN 0032-3896, 01/2018, Volume 50, Issue 1, pp. 45 - 55
We present a focused review of photoresist strategies that have been studied over the past few decades driven by the demands of Moore's law. Selected results... 
COPOLYMER RESISTS | ORGANOELEMENT RESISTS | NANOPARTICLE PHOTORESISTS | POLYMER SCIENCE | CHEMICAL AMPLIFICATION | MOLECULAR GLASS RESISTS | TRANSPARENCY | BLOCK | 157 NM | DERIVATIVES | LITHOGRAPHY | Polymer chemistry | Moore's law | Photoresists
Journal Article
IEEE Network, ISSN 0890-8044, 2/2019, Volume 33, Issue 5, pp. 1 - 7
Privacy is supreme in cryptocurrencies since most users do not want to reveal their identities or the transaction amount in financial transactions.... 
Privacy | Protocols | Public key | Bitcoin | Blockchain | Resists
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 3/2013, Volume 8682, pp. 868216 - 868216-11
Highly sensitive EUV photoresists remain a critical challenge to enable high volume manufacturing with EUV lithography. Chemically amplified resists continue... 
EUV resists | Trifluoromethacrylates | Fluorinated resists | Fluorinated polymers | Copolymers | Lithography | Resists | Photons | Vinyl ethers | Ethers | Fluorination | Optimization
Conference Proceeding
1987, ISBN 9789794280249, ix, 97 p., [1] leaf of plates
Book
Angewandte Chemie International Edition, ISSN 1433-7851, 06/2017, Volume 56, Issue 24, pp. 6749 - 6752
A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Initial studies revealed that with this... 
heterometallic compounds | supramolecular assembly | lithography | resist materials | RINGS | CAGES | CHEMISTRY, MULTIDISCIPLINARY | Integrated circuit fabrication | Usage | Plasma | High resolution | Electron beam lithography | Lithography | Resists | Etching | Selectivity | Plasmas | Electrons
Journal Article
Science, ISSN 0036-8075, 5/2010, Volume 328, Issue 5979, pp. 732 - 735
Journal Article
Macromolecules, ISSN 0024-9297, 05/2010, Volume 43, Issue 9, pp. 4275 - 4286
A soft-contact film transfer method was developed to prepare multilayer photoresist thin films that enable high-resolution spectroscopic and reflectivity... 
DYNAMIC HETEROGENEITY | CHEMICALLY AMPLIFIED PHOTORESISTS | ACID DIFFUSION | POLYMER SCIENCE | POLY(METHYL METHACRYLATE) | INTERFEROMETRIC LITHOGRAPHY | MOLECULAR GLASS RESISTS | NEUTRON REFLECTIVITY | AMPLIFICATION RESISTS | DEEP-ULTRAVIOLET RESISTS | LINE EDGE ROUGHNESS
Journal Article
2017 IEEE Symposium on Security and Privacy (SP), ISSN 1081-6011, 05/2017, pp. 39 - 57
Neural networks provide state-of-the-art results for most machine learning tasks. Unfortunately, neural networks are vulnerable to adversarial examples: given... 
Measurement | Neural networks | Speech recognition | Resists | Robustness | Malware | Security
Conference Proceeding
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