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self-aligned double patterning (62) 62
lithography (30) 30
sadp (25) 25
engineering, electrical & electronic (24) 24
patterning (21) 21
double patterning (14) 14
self-aligned quadruple patterning (14) 14
etching (12) 12
nanoscience & nanotechnology (12) 12
layout (11) 11
computer science, hardware & architecture (10) 10
optics (10) 10
materials science, multidisciplinary (9) 9
overlay (9) 9
routing (9) 9
decomposition (8) 8
color (7) 7
saqp (7) 7
spacers (7) 7
computer science, interdisciplinary applications (6) 6
design engineering (6) 6
layout decomposition (6) 6
mandrels (6) 6
metals (6) 6
physics, applied (6) 6
self-aligned multiple patterning (6) 6
spacer (6) 6
algorithms (5) 5
capacitance (5) 5
directed self-assembly (5) 5
euv (5) 5
ler (5) 5
optimization (5) 5
self alignment (5) 5
wires (5) 5
パター (5) 5
側壁 (5) 5
設計 (5) 5
density (4) 4
dielectrics (4) 4
finfet (4) 4
line edge roughness (4) 4
manufacturability (4) 4
multiple patterning (4) 4
quadruple patterning (4) 4
resistance (4) 4
samp (4) 4
self-aligned (4) 4
self-aligned block (4) 4
sidewall process (4) 4
ターニング (4) 4
ダブル (4) 4
側壁ダブルパターニング (4) 4
手法 (4) 4
技術 (4) 4
設計技術 (4) 4
algorithm design and analysis (3) 3
alignment (3) 3
analysis (3) 3
beol (3) 3
design for manufacturability (3) 3
edge placement error (3) 3
extreme ultraviolet lithography (3) 3
immersion (3) 3
integrated circuits (3) 3
layout design (3) 3
line width roughness (3) 3
line-edge roughness (3) 3
logic gates (3) 3
mandrel (3) 3
microloading (3) 3
nanostructure (3) 3
pin access (3) 3
process control (3) 3
ps-b-pmma (3) 3
self aligned double patterning (3) 3
self-aligned double (3) 3
triple (3) 3
usage (3) 3
variability (3) 3
リソグラフィ (3) 3
側壁加工 (3) 3
超微細 (3) 3
配線 (3) 3
2d self-aligned via (2) 2
2色グリッド (2) 2
30nm half-pitch nand flash (2) 2
algorithm (2) 2
arf lithography (2) 2
back-end-of-line (2) 2
carbon (2) 2
clocks (2) 2
contact (2) 2
cut mask optimization (2) 2
cutting (2) 2
delays (2) 2
density multiplication (2) 2
deposition (2) 2
design and construction (2) 2
design for manufacturing (2) 2
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Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2008, Volume 6924
Conference Proceeding
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, ISSN 0278-0070, 03/2018, Volume 37, Issue 3, pp. 657 - 668
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2012, Volume 8327
Self-Aligned Double Patterning (SADP) has become one of the most promising processes for 20nm node technology and beyond... 
SAQP | SADP | Self-aligned quadruple patterning | Self-aligned double patterning | Double patterning | Cutting | Patterning | Mandrels | Design for manufacturability | Images | Joining | Robustness | Painted
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2011, Volume 7973
193nm immersion lithography, with the single-exposure resolution limitation of half-pitch 38nm, has extended its patterning capability to about 20nm using the double-patterning technique[1... 
Quadruple patterning | Sub-16nm half-pitch | SAQP | SADP | 15nm half-pitch | Self-aligned double patterning | Mass production | Patterning | Lithography | Tools | Immersion | Assessments | Pools | Spacers
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2009, Volume 7275
The Sidewall Spacer Double Patterning (SSDP) technique, also referred to as Self-Aligned Double Patterning (SADP... 
Layout decomposition | SSDP | Self-aligned | SADP | Sidewall spacer | Double patterning
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2011, Volume 7973
In many ways, sidewall spacer double patterning has created a new paradigm for lithographic roadmaps... 
Patterning | Lithography | Stencil | EUV | Self-aligned double patterning | Mandrel | BEOL routing | Directed self-assembly | PS-b-PMMA | DSA | 15nm | Sidewall spacer | Quadruple patterning | SADP | Triple patterning | Self assembly | Multiplication | Mandrels | Laminates | Density | Spacers
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2009, Volume 7274
Although the Numerical Aperture (NA) has been greatly improved from 0.93 (dry) to 1.35 (wet) by the introduction of modern water immersion 193nm scanner since... 
Scanners with high index fluids | Immersion scanner | Alignment | Self-aligned double pattern (SADP) | Double patterning technique (DPT) | Extreme UV (EUV) | Overlay | 193nm dry scanner | Sub-40 nm
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2009, Volume 7272
.... Self-aligned double patterning (SADP) process is one of several DPT approaches, and most likely be introduced into NAND flash manufacture... 
NAND FLASH | 193nm immersion lithography | Self-aligned double patterning (SADP)
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2012, Volume 8328
Self-aligned triple patterning (SATP) technique offers both improved resolution and quasi-2D design flexibility for scaling integrated circuits down to sub-15nm half pitch... 
triple (SATP) | Self-aligned double (SADP) | spacer | self-aligned mandrel recession (SMR) | mandrel | quadruple (SAQP) patterning | Patterning | Mandrels | Oxides | Performance enhancement | Etching | Nanostructure | Density | Spacers
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2009, Volume 7274
Self-Aligned Double patterning (SADP) technology has been identified as the main stream patterning technique for NAND FLASH manufacturers for 3xnm and beyond... 
32nm half-pitch NAND FLASH | Electrical testable structure | Self-aligned double patterning (SADP)
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2009, Volume 7274
Double patterning (DP) is today the main solution to extend immersion lithography to the 32 nm node and beyond... 
LELE | CDU | Topography | Reticle budget | Spacer self-aligned (SADP) | Dry ArF scanner | Overlay | Low-ki lithography | Double patterning
Conference Proceeding
by Kim, SK
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, ISSN 1533-4880, 12/2014, Volume 14, Issue 12, pp. 9454 - 9458
.... The self-aligned double patterning (SADP) and the self-aligned multiple patterning (SAMP) are promising technologies that can be expanded to 22 nm and 1 x nm patterns for the dynamic random access memory... 
PHYSICS, CONDENSED MATTER | PHYSICS, APPLIED | Lithography | MATERIALS SCIENCE, MULTIDISCIPLINARY | NANOSCIENCE & NANOTECHNOLOGY | SATP | CHEMISTRY, MULTIDISCIPLINARY | Lithography Simulation | Double Patterning | Self-Aligned DP | SAMP | Multiple Patterning | SADP | Patterning | Algorithms | Process parameters | Mathematical models | Nanostructure | Density | Dynamic random access memory
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2009, Volume 7274
.... Self Aligned Double Patterning (SADP) has the advantage of dense array definition without overlay issue and is hence useful for memory device... 
30nm half-pitch NAND FLASH | ArF lithography | Self-aligned double patterning (SADP) | Data decomposition
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2012, Volume 8323
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2012, Volume 8326
Conference Proceeding
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2012, Volume 8325
Conference Proceeding
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