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trimethylaluminum (649) 649
chemistry, inorganic & nuclear (158) 158
chemistry, physical (144) 144
materials science, multidisciplinary (137) 137
chemistry, organic (110) 110
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growth (108) 108
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aluminum (97) 97
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methylalumoxane (29) 29
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ethylene (28) 28
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trimethylgallium (28) 28
activation (27) 27
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alumina (22) 22
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mao (21) 21
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Journal of Physical Chemistry C, ISSN 1932-7447, 07/2015, Volume 119, Issue 26, pp. 14585 - 14592
Sequential infiltration synthesis (SIS) is a method for growing inorganic materials within polymers in an atomically controlled fashion. This technique can... 
POLYMERS | POLYSTYRENE | FILMS | FTIR | MATERIALS SCIENCE, MULTIDISCIPLINARY | CHEMISTRY, PHYSICAL | NANOSCIENCE & NANOTECHNOLOGY | ATOMIC LAYER DEPOSITION | TRIMETHYLALUMINUM
Journal Article
Dalton Transactions, ISSN 1477-9226, 1/2016, Volume 45, Issue 3, pp. 1176 - 1184
Molecular layer deposition (MLD) of hybrid organic-inorganic thin films called "titanicones" was achieved using tetrakisdimethylaminotitanium (TDMAT) and... 
THIN-FILMS | ELLIPSOMETRIC POROSIMETRY | ETHYLENE-GLYCOL | GROWTH | TICL4 | TRIMETHYLALUMINUM | CHEMISTRY, INORGANIC & NUCLEAR
Journal Article
Angewandte Chemie (International ed.), ISSN 1521-3773, 2003, Volume 42, Issue 45, pp. 5548 - 5554
New materials, namely high‐k (high‐permittivity) dielectrics to replace SiO2, Cu to replace Al, and barrier materials for Cu, are revolutionizing modern... 
atomic layer deposition | nitrides | oxides | microelectronics | thin films | Thin films | Nitrides | Oxides | Microelectronics | Atomic layer deposition | THIN-FILMS | TAN | ALLYLAMINE | TERT-BUTYLAMINE | OXIDE | COPPER | CHEMISTRY, MULTIDISCIPLINARY | GROWTH | SURFACE | DIFFUSION BARRIER | TRIMETHYLALUMINUM
Journal Article
Accounts of Chemical Research, ISSN 0001-4842, 03/2018, Volume 51, Issue 3, pp. 800 - 809
Conspectus The deposition of thin solid films is central to many industrial applications, and chemical vapor deposition (CVD) methods are particularly useful... 
ORGANIC-CHEMISTRY | OXIDE | METHYLCYCLOPENTADIENYL MANGANESE TRICARBONYL | ALD PRECURSORS | GAS-PHASE | COPPER | ATOMIC LAYER DEPOSITION | CHEMISTRY, MULTIDISCIPLINARY | THERMAL CHEMISTRY | MASS-SPECTROMETRY | TRIMETHYLALUMINUM | Chemistry
Journal Article
Inorganic Chemistry, ISSN 0020-1669, 10/2017, Volume 56, Issue 20, pp. 12436 - 12447
The synthesis and characterization of a new family of phosphine oxide supported aluminum formazanate complexes (7a,b, 8a, 9a) are reported. X-ray diffraction... 
ELECTROGENERATED CHEMILUMINESCENCE | CYCLIC ESTERS | ELEMENTS | ELECTROCHEMICAL PROPERTIES | ANALOGS | ELECTROCHEMILUMINESCENCE | BETA-DIKETIMINATE | RING-OPENING POLYMERIZATION | COPOLYMERIZATION | TRIMETHYLALUMINUM | CHEMISTRY, INORGANIC & NUCLEAR
Journal Article
Dalton transactions : an international journal of inorganic chemistry, ISSN 1477-9234, 2018, Volume 47, Issue 48, pp. 17291 - 17298
Ionized methylalumoxane exchanges alkyl groups rapidly with trialkylaluminums in solution, generating statistical mixtures of modified methylalumoxane anions.... 
OLEFIN-POLYMERIZATION | PRESSURIZED SAMPLE INFUSION | ALKYLALUMOXANES | LIQUID ALUMINUM ALKYLS | COCATALYSTS | MONOMER-DIMER EQUILIBRIA | MAO | TERT-BUTYLALUMINUM | TRIMETHYLALUMINUM | METHYLALUMINOXANE | CHEMISTRY, INORGANIC & NUCLEAR
Journal Article
Journal of catalysis, ISSN 0021-9517, 2015, Volume 323, pp. 76 - 84
[Display omitted] •Ni-AlSBA-15 was prepared by post-synthesis alumination and ion exchange.•Ni-AlSBA-15 was used as catalyst in the ethylene... 
Nickel | Oligomerization | AlSBA-15 | Post-synthesis alumination | Ethylene | NICKEL-COMPLEXES | SILICA-ALUMINA | SELECTIVE DIMERIZATION | CHEMISTRY, PHYSICAL | MOLECULAR-SIEVES | MCM-41 | ENGINEERING, CHEMICAL | ETHENE | SBA-15 | ZEOLITE | TRIMETHYLALUMINUM | Oligomers | Chemical Sciences | Catalysis
Journal Article
Nanotechnology, ISSN 0957-4484, 09/2016, Volume 27, Issue 43, p. 434002
Black phosphorus (BP), the bulk counterpart of monolayer phosphorene, is a relatively stable phosphorus allotrope at room temperature. However, monolayer... 
ALD | passivation | XPS | black phosphorus | FET | phosphorene | PHYSICS, APPLIED | TRANSPORT-PROPERTIES | MATERIALS SCIENCE, MULTIDISCIPLINARY | 2-DIMENSIONAL ELECTRON-GAS | OPTICAL-PROPERTIES | NANOSCIENCE & NANOTECHNOLOGY | PHOTOIONIZATION CROSS-SECTIONS | TRANSISTORS | AL2O3 | ATOMIC LAYER DEPOSITION | TRIMETHYLALUMINUM
Journal Article
Organic Letters, ISSN 1523-7060, 01/2017, Volume 19, Issue 2, pp. 340 - 343
Conjugate addition of organometallic reagents to enones to form silyl enol ether products is a versatile method to difunctionalize activated olefins, but the... 
KETONES | REAGENTS | MECHANISM | COUPLING REACTIONS | COMPLEXES | CHEMISTRY | CHEMISTRY, ORGANIC | ORGANIC HALIDES | ALDEHYDES | TRIMETHYLALUMINUM | Bromides | Molecular Structure | Catalysis | Nickel - chemistry | Ethers | Letter
Journal Article
Chemistry of Materials, ISSN 0897-4756, 08/2018, Volume 30, Issue 15, pp. 5087 - 5097
Molecular layer deposition (MLD) is of growing interest as a vapor-phase method for depositing ultrathin polymeric films. The amount of material deposited per... 
VAPOR-DEPOSITION | GE-2 X-1 | CONDUCTIVITY | MATERIALS SCIENCE, MULTIDISCIPLINARY | GROWTH | ORGANIC FILMS | CHEMISTRY, PHYSICAL | NANOSCALE | ADSORPTION | POLYUREA FILMS | THIN-FILM | TRIMETHYLALUMINUM | INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
Journal Article
Chemistry of Materials, ISSN 0897-4756, 02/2017, Volume 29, Issue 3, pp. 1192 - 1203
An experimental investigation into the growth of polyurea films by molecular layer deposition was performed by examining trends in the growth rate,... 
THIN-FILMS | INORGANIC HYBRID MATERIALS | SPECTROSCOPY | MATERIALS SCIENCE, MULTIDISCIPLINARY | GROWTH | CHARGE-TRANSPORT | ORGANIC FILMS | CHEMISTRY, PHYSICAL | NANOSCALE | POLYMERIZATION | UREA ELASTOMERS | TRIMETHYLALUMINUM | INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY | MATERIALS SCIENCE
Journal Article
ACS Applied Materials & Interfaces, ISSN 1944-8244, 11/2016, Volume 8, Issue 44, pp. 30564 - 30575
Atomic layer deposition (ALD) of ultrathin aluminum oxide (AlO x ) films was systematically studied on supported chemical vapor deposition (CVD) graphene. We... 
Research | aluminum oxide | atomic layer deposition | ultrathin films | conformal deposition | graphene | WETTABILITY | MATERIALS SCIENCE, MULTIDISCIPLINARY | SUPPORTED GRAPHENE | NANOSCIENCE & NANOTECHNOLOGY | TRANSISTORS | SPECTROSCOPY | AL2O3 FILMS | DIELECTRICS | GROWTH | STRAIN | TRIMETHYLALUMINUM | PRISTINE
Journal Article
Dalton transactions : an international journal of inorganic chemistry, ISSN 1477-9226, 03/2014, Volume 43, Issue 9, pp. 3492 - 3500
A main goal in the construction of thin films is to control film growth in all aspects. Accurate control of the building blocks and their reaction sites is one... 
Journal Article
Journal of the American Chemical Society, ISSN 0002-7863, 02/2017, Volume 139, Issue 6, pp. 2456 - 2463
Operando surface-enhanced Raman spectroscopy (SERS) was used to successfully identify hitherto unknown dimeric methylalumina surface species during atomic... 
NANOPARTICLES | MECHANISM | GROWTH | FTIR SPECTROSCOPY | CHEMISTRY | METAL-ORGANIC FRAMEWORK | AL2O3 | LOW-TEMPERATURE | CHEMISTRY, MULTIDISCIPLINARY | TRIMETHYLALUMINUM | ALUMINA | Density functionals | Usage | Scattering (Physics) | Raman spectroscopy | Surface plasmon resonance spectroscopy | Chemistry
Journal Article
ACS Applied Materials & Interfaces, ISSN 1944-8244, 03/2017, Volume 9, Issue 11, pp. 10296 - 10307
Journal Article
Langmuir, ISSN 0743-7463, 09/2017, Volume 33, Issue 38, pp. 9657 - 9665
Molecular layer deposition (MLD) is an increasingly used deposition technique for producing thin coatings consisting of purely organic or hybrid... 
ALUMINUM | MATERIALS SCIENCE, MULTIDISCIPLINARY | GROWTH | CHEMISTRY | CHEMISTRY, PHYSICAL | POLYMER THIN-FILMS | CHEMISTRY, MULTIDISCIPLINARY | TRIMETHYLALUMINUM
Journal Article
RSC Advances, ISSN 2046-2069, 2015, Volume 5, Issue 17, pp. 12824 - 12829
The ALD process emissions and the associated chemical reaction mechanism in the ALD of the Al2O3 system are studied and reported. In gaseous emissions, 3.22... 
THIN-FILMS | ALUMINUM | SENSITIZED SOLAR-CELLS | OXIDE | SURFACE PASSIVATION | XPS | CHEMISTRY, MULTIDISCIPLINARY | TRIMETHYLALUMINUM
Journal Article
Applied Physics Letters, ISSN 0003-6951, 08/2017, Volume 111, Issue 8, p. 82101
We investigate different methods of passivating sidewalls of wet etched InAs heterostructures in order to suppress inherent edge conduction that is presumed to... 
THIN-FILMS | PHYSICS, APPLIED | REDUCING AGENT | GROWN INAS SURFACES | OXIDES | ELECTRON ACCUMULATION | ATOMIC LAYER DEPOSITION | NANOWIRES | GAAS | TRIMETHYLALUMINUM | Physics - Mesoscale and Nanoscale Physics
Journal Article
ACS applied materials & interfaces, ISSN 1944-8252, 2018, Volume 10, Issue 44, pp. 38588 - 38595
Atomic layer etching (ALE) provides Angstrom-level control over material removal and holds potential for addressing the challenges in nanomanufacturing faced... 
isotropic removal | ZnO | nanowires | atomic layer etching | plasma etching | MECHANISM | SN(ACAC) | SELF-LIMITING FLUORINATION | DEPOSITION | MATERIALS SCIENCE, MULTIDISCIPLINARY | ION | NANOSCIENCE & NANOTECHNOLOGY | SEQUENTIAL REACTIONS | TRIMETHYLALUMINUM | SIO2
Journal Article
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