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Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2013, Volume 8880
Half-pitch (hp) 11 to 7.5nm will be resolution requirement for 3 to 5 years later in lithography technology. In specific, hp16nm in 2015 and hp11nm in 2019 for... 
EB lithography | mold | Nanoimprint lithography | XR-1541 | HSQ | Fogging | Residues | Patterning | Developers | Lithography | Resists | Media | Pillars
Conference Proceeding
Trans. Electr. Electron. Mater. (TEEM), ISSN 1229-7607, 2010, Volume 11, Issue 4, p. 190
This report covers an effective fabrication method of graphene nanoribbon for top-gated field effect transistors (FETs) utilizing electron beam lithography... 
XR-1541/PMMA | Electron beam Lithography | Graphene nanoribbon
Journal Article
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