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Carbon, ISSN 0008-6223, 03/2014, Volume 68, pp. 473 - 479
Journal Article
Wear, ISSN 0043-1648, 12/2018, Volume 416-417, pp. 36 - 43
The synergetic effects of chemical-mechanical interactions are key to generate atomically flat surfaces during polishing... 
Cobalt | Chemical mechanical polishing | Chemical-mechanical interactions | PH | GLYCINE | BEHAVIOR | MATERIALS SCIENCE, MULTIDISCIPLINARY | CMP | CORROSION | SINGLE-FREQUENCY | H2O2 | ENGINEERING, MECHANICAL | SPECTROSCOPY | LAYER | WATER | Oxidation-reduction reaction | Mechanical engineering | Tribology
Journal Article
Surface & Coatings Technology, ISSN 0257-8972, 05/2015, Volume 270, pp. 206 - 220
Journal Article
Materials science forum, ISSN 0255-5476, 10/2016, Volume 874, pp. 151 - 157
...), the ultraprecision mirror made of sapphire (α-alumina) is required to polish. The focal length of the mirror is 7 km and it must be finished by polishing after grinding... 
Polishing rate | Crystal orientation | Sapphire | Chemical mechanical polishing | Hand tools | Polishes | Polishing | Polished | Abrasives | Interferometers | Crystal structure
Journal Article
International Journal of Machine Tools and Manufacture, ISSN 0890-6955, 10/2016, Volume 109, pp. 49 - 57
Journal Article
Electrochimica Acta, ISSN 0013-4686, 2007, Volume 52, Issue 5, pp. 1825 - 1838
...–mechanical polishing (CMP) slurries and post-CMP cleaning solutions. Electrochemical and surface analyses of commercial and new developed CMP slurries over the last decade are discussed... 
ULSI | Copper | Passivity | CMP | Post-CMP cleaning | ELECTROCHEMISTRY | DODECYL-SULFATE | SLURRY | BEHAVIOR | post-CMP cleaning | CORROSION-INHIBITOR | FILMS | SURFACE | copper | METAL | passivity | PLANARIZATION | BENZOTRIAZOLE
Journal Article
Precision engineering, ISSN 0141-6359, 2017, Volume 47, pp. 122 - 130
•The polishing ability of EGCP is analyzed analytically and numerically.•An analytic expression is given for evaluating the polishing ability of EGCP... 
Electrochemistry | Chemical polishing | Numerical simulation | Polishing ability | Roughness | SCANNING ELECTROCHEMICAL MICROSCOPY | INSTRUMENTS & INSTRUMENTATION | ENGINEERING, MULTIDISCIPLINARY | NANOSCIENCE & NANOTECHNOLOGY | COPPER | ENGINEERING, MANUFACTURING | FEEDBACK MODE | Copper products | Analysis | Numerical analysis
Journal Article
Journal of materials processing technology, ISSN 0924-0136, 2019, Volume 263, pp. 330 - 335
A low-amplitude megasonic vibrator with a frequency of 1.7 MHz has been designed in order to improve the polishing effect of silicon wafers in the process of megasonic-assisted chemical-mechanical polishing... 
Vibrator | Chemical-mechanical polishing | Megasonic | Roughness | Silicon wafer | MATERIALS SCIENCE, MULTIDISCIPLINARY | PARTICLE REMOVAL | ENGINEERING, MANUFACTURING | ENGINEERING, INDUSTRIAL
Journal Article
Journal of the American Ceramic Society, ISSN 0002-7820, 01/2017, Volume 100, Issue 1, pp. 96 - 107
In this work, the polishing‐induced contamination layer at the fused silica optics surface was studied with various interface analysis techniques... 
fused silica | spectroscopy | impurities | polishing | FILMS | DAMAGE THRESHOLD | MATERIALS SCIENCE, CERAMICS | SURFACES | Mass spectrometry | Silica | X-ray spectroscopy | Optics | Silicas | Surface defects | Fused silica | Secondary ion mass spectroscopy | Homogeneity | Cerium | Iron | Electron probes | Contamination | Material chemistry | Physics | Chemical Sciences
Journal Article
Electrochimica Acta, ISSN 0013-4686, 05/2018, Volume 271, pp. 666 - 676
In an attempt to realize the high-quality and highly efficient polishing of SiC, the anodic oxidation mechanism of SiC was studied to enable the application of electrochemical mechanical polishing (ECMP... 
Anodic oxidation mechanism | SiC | Etch pits | Electrochemical mechanical polishing | ELECTROCHEMISTRY | OXIDE | CHEMICAL-VAPOR-DEPOSITION | SILICON-CARBIDE | THERMAL-OXIDATION | FILMS | SIC POLYTYPES | GROWTH | SURFACE | Atomic force microscopy | Oxidation-reduction reaction | Silicon carbide | Analysis | Investigations
Journal Article
Separation and purification technology, ISSN 1383-5866, 2019, Volume 211, pp. 63 - 70
•Ceria-based abrasive is separated from glass polishing powder waste directly.•Liquid-liquid powder extraction method is applied for the separation... 
Abrasive | Sodium oleate | Rare earth element | Liquid–liquid–powder extraction | Kerosene | Cerium oxide | Recovery | RARE-EARTHS | ENGINEERING, CHEMICAL | FLOTATION | Liquid-liquid-powder-extraction | MONAZITE | Petroleum mining | Cerium | Powders | Surface active agents | Green technology
Journal Article
RSC Advances, ISSN 2046-2069, 02/2018, Volume 8, Issue 12, pp. 6544 - 655
Journal Article
Diamond & Related Materials, ISSN 0925-9635, 03/2016, Volume 63, pp. 80 - 85
The polishing mechanisms and surface damages of mechanically and chemically polished diamond crystals were investigated... 
Chemical | Mechanical | Polishing | Diamond | SEM | Quartz | SiO2 | Hydrogen termination | SiO | PHYSICS, CONDENSED MATTER | PHYSICS, APPLIED | MATERIALS SCIENCE, MULTIDISCIPLINARY | MATERIALS SCIENCE, COATINGS & FILMS | Hydrogen | Analysis | Methods | Crystal defects | Fracture mechanics | Wheels | Diamonds | Polished | Damage | Silicon dioxide
Journal Article