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2006, ISBN 0819458457, xxxv, 1057
This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume... 
Ultraviolet radiation | Industrial applications | Lithography | Plasma (Ionized gases) | Dental caries | Treatment | Diagnosis
Book
Plasma sources science and technology, ISSN 0963-0252, 04/2015, Volume 24, Issue 3, pp. 35003 - 7
An experimental setup that directly reproduces extreme ultraviolet (EUV) lithography relevant conditions for detailed component exposure tests is described.... 
METIS-310344 | IR-95672 | Extreme ultraviolet | Plasma probe | EUV source | EUV-induced plasma | IRRADIATION | MULTILAYER MIRRORS | PHYSICS, FLUIDS & PLASMAS | extreme ultraviolet | plasma probe | LITHOGRAPHY | Filtering | Lithography | Evolution | Plasma radiation | Diagnostic systems | Ultraviolet | Physical properties | Chambers
Journal Article
Laser and Particle Beams, ISSN 0263-0346, 2019, Volume 37, Issue 1, pp. 49 - 54
Irradiation of gases with intense pulses of extreme ultraviolet (EUV) can result in the formation of low-temperature plasmas. During the time of irradiation,... 
EUV optics | EUV source | laser-produced plasma | photoionization | PHYSICS, APPLIED | LASER | XENON | DRIVEN | PHOTOIONIZATION EXPERIMENTS | LINES | Plasma | Laboratories | Hydrogen | Radiation | Emission | Photons | Time measurement | Helium | Photodiodes | Experiments | Emissions | Gases | Neon | Lasers | Dependence | Irradiation | Emission measurements | Photoelectrons | Plasmas | Low temperature | Extreme values
Journal Article
Review of Scientific Instruments, ISSN 0034-6748, 01/2018, Volume 89, Issue 1, p. 015108
The knowledge and the manipulation of light polarization state in the vacuum ultraviolet and extreme ultraviolet (EUV) spectral regions play a crucial role... 
POLARIZATION PROPERTIES | VACUUM-ULTRAVIOLET | VUV REGION | INSTRUMENTS & INSTRUMENTATION | PHYSICS, APPLIED | OPTICAL-CONSTANTS | SYNCHROTRON-RADIATION | EXTREME-ULTRAVIOLET | STOKES PARAMETERS | RANGE | Thin films | Aluminum | Optical properties | Ultraviolet spectra | Surface properties | Materials science | Optical components | Polarimetry | Optical coatings
Journal Article
Reactive and Functional Polymers, ISSN 1381-5148, 10/2018, Volume 131, pp. 361 - 367
We synthesized various hyperbranched polyacetals poly(t-BCRA[4]-co-BVOC), poly(t-BCRA[4]-co-BVOP), poly(t-BCRA[4]-co-BVOXP), poly(t-BCRA[4]-co-BVBC), and... 
Hyperbranched polyacetals | Positive-type resist | Extreme ultraviolet light | Main-chain scission-type resist | POLYMERS | POLYMER SCIENCE | MOLECULAR RESISTS | CYCLIC OLIGOMER | (EUV)-RESIST MATERIAL | ENGINEERING, CHEMICAL | NORIA | CHEMISTRY, APPLIED | DERIVATIVES | Acetal resins | Cyclohexane
Journal Article
Optics Letters, ISSN 0146-9592, 12/2017, Volume 42, Issue 24, pp. 5070 - 5073
The effect of Be layers on the reflection coefficients of Mo/Be/Si multilayer mirrors in the extreme ultraviolet (EUV) region is reported. Samples were studied... 
TRANSMISSION | OPTICS | MO/SI MULTILAYERS | EXTREME-ULTRAVIOLET | MIRRORS
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2011, Volume 7972
Although Extreme ultraviolet lithography (EUVL) is now well into the commercialization phase, critical challenges remain in the development of EUV resist... 
Extreme ultraviolet | Nanolithography | Lithography | Photoresist | Amplification | Meetings | Resists | Roughness | Ultraviolet | Commercialization
Conference Proceeding
Journal of Physics B: Atomic, Molecular and Optical Physics, ISSN 0953-4075, 07/2010, Volume 43, Issue 14, pp. 144018 - 144018
Spectroscopy in the extreme ultraviolet region is important to magnetic fusion research as well as to astrophysics. We report on XEUS (X-ray and Extreme... 
SPECTROMETER | SOFT-X-RAY | LINE EMISSION | ANGSTROM | ASTROPHYSICS | EXTREME-ULTRAVIOLET | PHYSICS, ATOMIC, MOLECULAR & CHEMICAL | OPTICS | PLASMA DIAGNOSTICS | BEAM ION-TRAP | REGION | Spectroscopy | Impurities | Emission analysis | Ultraviolet spectrometers | X-rays | Emission | Diagnostic systems | Tokamak devices
Journal Article
IEEE Photonics Journal, ISSN 1943-0655, 08/2017, Volume 9, Issue 4, pp. 1 - 8
Journal Article
Scientific Reports, ISSN 2045-2322, 03/2015, Volume 5, Issue 1, p. 9235
Extreme ultraviolet (EUV) lithography at 13.5 nm is the main candidate for patterning integrated circuits and reaching sub-10-nm resolution within the next... 
MULTIDISCIPLINARY SCIENCES | EXTREME-ULTRAVIOLET | RESOLUTION | Adaptations | Integrated circuits | Photons | X rays | Wavelength
Journal Article
IEEE Journal of Selected Topics in Quantum Electronics, ISSN 1077-260X, 11/2014, Volume 20, Issue 6, pp. 306 - 316
Journal Article
Optics letters, ISSN 0146-9592, 2011, Volume 36, Issue 17, pp. 3344 - 3346
We have developed a multilayer mirror for extreme UV (EUV) radiation (13.5nm), which has near-zero reflectance for IR line radiation (10.6 mu m). The EUV... 
METIS-277892 | OPTICS | EXTREME-ULTRAVIOLET | MIRRORS | LAYERS
Journal Article
Astrophysical Journal, ISSN 0004-637X, 07/2016, Volume 825, Issue 1, pp. 27 - 27
Journal Article
Journal of Physics B: Atomic, Molecular and Optical Physics, ISSN 0953-4075, 07/2015, Volume 48, Issue 14, pp. 144025 - 16
The primary requirement for the development of tools for extreme ultraviolet lithography (EUVL) has been the identification and optimization of suitable... 
SN PLASMAS | TARGET | lithography source development | LASER-PRODUCED PLASMAS | PHYSICS, ATOMIC, MOLECULAR & CHEMICAL | REGION | BEUV spectra | EXTREME-ULTRAVIOLET EMISSION | XENON | OPTICS | SPECTRA | EUV spectra | LITHOGRAPHY | Charged ions | Wavelengths | Pollution sources | Lithography | Emission analysis | Emitters | Plasmas | Ultraviolet
Journal Article
Physics of Plasmas, ISSN 1070-664X, 2014, Volume 21, Issue 7, p. 73303
In this paper, results of spectral investigations of low temperature photoionized plasmas, created by irradiation of gases with intense pulses of extreme... 
RATES | CROSS-SECTIONS | NEON | ELECTRON-IMPACT-EXCITATION | PHYSICS, FLUIDS & PLASMAS | PHOTOELECTRON | SURFACE | DRIVEN | EV PHOTON ENERGY | RADIATION | NEODYMIUM LASERS | PHOTOIONIZATION | PULSED IRRADIATION | 70 PLASMA PHYSICS AND FUSION TECHNOLOGY | WAVELENGTHS | BEAMS | LASER-PRODUCED PLASMA | IONS | EXTREME ULTRAVIOLET RADIATION | PULSES
Journal Article