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IEEE Transactions on Electron Devices, ISSN 0018-9383, 04/2015, Volume 62, Issue 4, pp. 1223 - 1229
An improved Bosch etching process using inductively coupled plasma system has been investigated for the etching of 4H-silicon carbide (SiC). By optimizing the... 
4H-silicon carbide (SiC) | Silicon carbide | Iterative closest point algorithm | breakdown voltage | mesa | Bosch etching | Ions | Etching | inductively coupled plasma (ICP) | P-i-n diodes | Passivation | p-i-n diodes | OXIDATION | SIC PIN DIODES | PHYSICS, APPLIED | TRENCH | ENGINEERING, ELECTRICAL & ELECTRONIC | Usage | Plasma etching | Silicon diodes | Research | Properties | Scanning microscopy
Journal Article
Nanotechnology, ISSN 0957-4484, 02/2015, Volume 26, Issue 8, pp. 085302 - 085302
Sapphire nanopatterning is the key solution to GaN light emitting diode (LED) light extraction. One challenge is to etch deep nanostructures with a vertical... 
SiO | sapphire nanopattern | nanoimprint | LED light extraction | ICP etching | mask | PHYSICS, APPLIED | MATERIALS SCIENCE, MULTIDISCIPLINARY | SILICON | NANOSCIENCE & NANOTECHNOLOGY | SiO2 mask | ETCHER | INDUCTIVELY-COUPLED PLASMAS | Inductively coupled plasma | Sapphire | Chromium | Masking | Etching | Nanostructure | Masks | Cylinders
Journal Article
Microelectronic Engineering, ISSN 0167-9317, 12/2013, Volume 112, pp. 35 - 40
[Display omitted] •SU-8 is etched using inductively coupled plasma (ICP) RIE in O2 with SF6 added.•Anisotropic etching at etch rates around 750nmmin−1 is... 
Antimony | SF6 | SU-8 | Dry etching | Roughness | ICP-RIE | PHYSICS, APPLIED | NANOSCIENCE & NANOTECHNOLOGY | ENGINEERING, ELECTRICAL & ELECTRONIC | PHOTORESIST | SU8 | SYSTEMS | FABRICATION | OPTICS | Inductively coupled plasma | Oxygen plasma | Anisotropy | Bias | Etching | Plasma chemistry
Journal Article
physica status solidi (a), ISSN 1862-6300, 11/2015, Volume 212, Issue 11, pp. 2572 - 2577
The surface morphology of vicinal (100) single‐crystal diamond surfaces homoepitaxially grown in a microwave plasma‐assisted chemical vapor deposition (MPACVD)... 
plasma treatment | CVD diamond | ICP etching | single crystal | PHYSICS, CONDENSED MATTER | PHYSICS, APPLIED | MECHANISM | DEPOSITION | MATERIALS SCIENCE, MULTIDISCIPLINARY | PLASMA | HPHT | SURFACE | SINGLE-CRYSTAL DIAMOND | Chemical vapor deposition | Morphology | Single crystals | Inductively coupled plasma | Diamonds | Polishing | Etching | Substrates
Journal Article
Infrared Physics and Technology, ISSN 1350-4495, 05/2018, Volume 90, pp. 110 - 114
•High-quality InAs-based superlattice materials were achieved.•The effects of etching parameters on InAs and GaSb bulk materials were studied.•An ICP etching... 
InAs/GaAsSb superlattice | InAs-based | ICP etching | INSTRUMENTS & INSTRUMENTATION | PHYSICS, APPLIED | INP | OPTICS | INDUCTIVELY-COUPLED PLASMA | Detectors
Journal Article
physica status solidi (a), ISSN 1862-6300, 01/2019, Volume 216, Issue 1, pp. 1800530 - n/a
This work demonstrates hydrogen silsesquioxane (HSQ) etching resistance dependence on substrate. It is found that HSQ is barely etched on SiO2/Si substrate,... 
hydrogen silsesquioxane (HSQ) | inductively coupled plasma (ICP) etching | electron beam lithography (EBL) | self‐bias | self-bias | PHYSICS, CONDENSED MATTER | PHYSICS, APPLIED | MATERIALS SCIENCE, MULTIDISCIPLINARY | Silicon substrates | Inductively coupled plasma | Etching | Ion bombardment | Silicon dioxide | Dependence
Journal Article
Plasma Processes and Polymers, ISSN 1612-8850, 09/2016, Volume 13, Issue 9, pp. 869 - 878
Journal Article
Nanotechnology, ISSN 0957-4484, 04/2010, Volume 21, Issue 13, pp. 134014 - 134014
Semiconductor nanowaveguides are the key structure for light-guiding nanophotonics applications. Efficient guiding and confinement of single-mode light in... 
Aluminum gallium arsenides | Scanning electron microscopy | Gallium arsenides | Inductively coupled plasma | Nanocomposites | Semiconductors | Gallium arsenide | Nanomaterials | Nanostructure
Journal Article
Journal of Microelectromechanical Systems, ISSN 1057-7157, 04/2017, Volume 26, Issue 2, pp. 448 - 455
Journal Article
Microelectronic Engineering, ISSN 0167-9317, 06/2015, Volume 141, pp. 261 - 266
An ICP plasma etching technique for fabrication of tapered vias on silicon substrates has been developed by means of single patterning and etching process.... 
Through silicon via | Inductively coupled plasma (ICP) | Micro-electro-mechanical systems (MEMS) | Tapered via | Deep silicon etch | PHYSICS, APPLIED | NANOSCIENCE & NANOTECHNOLOGY | OPTICS | VIAS | ENGINEERING, ELECTRICAL & ELECTRONIC | Silicon | Patterning | Inductively coupled plasma | Adjustment | Silicon substrates | Running | Surface roughness | Etching | Optimization | Chambers
Journal Article
Nanotechnology, ISSN 0957-4484, 09/2016, Volume 27, Issue 41, p. 415302
Patterned chromium and its compounds are crucial materials for nanoscale patterning and chromium based devices. Here we investigate how temperature can be used... 
bit patterned media | chromium, inductively coupled plasma | dry etching | low temperature | ICP | oxygen concentration
Journal Article
Applied Surface Science, ISSN 0169-4332, 08/2014, Volume 311, pp. 68 - 73
•High etch rate, anisotropic patterning, smooth surface, and relatively high selectivity of TST to SiO2 is possible using Cl2/Ar and CF4/Ar ICPS.•XPS analysis... 
Ti–Sb–Te | Etching | Phase change material | ICP | Degradation | Phase change materials | Inductively coupled plasma | Diffusion rate | Chlorides | X-ray photoelectron spectroscopy | Gas mixtures
Journal Article
Microelectronic Engineering, ISSN 0167-9317, 06/2018, Volume 193, pp. 28 - 33
Al2O3 thin-film deposited by atomic layer deposition is an attractive plasma etch mask for Micro and Nano Electro-Mechanical Systems (MEMS and NEMS).... 
Inductively coupled plasma | Atomic layer deposition | Deep UV lithography | Electron beam lithography | Plasma etching | Aluminum oxide | PHYSICS, APPLIED | NANOSCIENCE & NANOTECHNOLOGY | ETCHING PROPERTIES | ENGINEERING, ELECTRICAL & ELECTRONIC | AL2O3 THIN-FILMS | ICP | OPTICS | LITHOGRAPHY
Journal Article
Journal of Micromechanics and Microengineering, ISSN 0960-1317, 01/2015, Volume 25, Issue 1, pp. 15016 - 9
To provide coherent x-ray sources for probing the dynamic structures of solid or liquid biological substances on the picosecond timescale, a high-aspect-ratio... 
x-ray resonator cavity | inductively coupled plasma (ICP) | BACKSCATTERING | INSTRUMENTS & INSTRUMENTATION | PHYSICS, APPLIED | FILM | DIFFRACTION | NANOSCIENCE & NANOTECHNOLOGY | ENGINEERING, ELECTRICAL & ELECTRONIC | Single crystals | Beams (radiation) | Inductively coupled plasma | Sapphire | X-rays | Holes | Etching | Resonators
Journal Article
Microelectronic Engineering, ISSN 0167-9317, 02/2015, Volume 133, pp. 129 - 133
[Display omitted] •Three types of GaN: MOVPE-grown, MBE-grown, ammonothermal-grown were used in the experiment.•Master stamp used in the experiment consisted... 
NIL | Soft stamp | ICP plasma | Nanoimprint lithography | Master stamp | GaN | REFLECTION | PHYSICS, APPLIED | NANOSCIENCE & NANOTECHNOLOGY | OPTICS | ENGINEERING, ELECTRICAL & ELECTRONIC | Liquors | Patterning | Inductively coupled plasma | Chlorine | Lithography | Gallium nitrides | Replication | Surface roughness | Etching | Nanostructure
Journal Article
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