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phase-shifting mask (137) 137
physics, applied (114) 114
optics (113) 113
lithography (70) 70
optical lithography (57) 57
engineering, electrical & electronic (50) 50
phase-shifting masks (49) 49
phase shifting mask (40) 40
phase-shifting (38) 38
resolution (38) 38
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attenuated phase-shifting mask (29) 29
design (29) 29
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nanoscience & nanotechnology (28) 28
phase shifting (28) 28
photolithography (28) 28
phasenverschiebung (25) 25
simulation (25) 25
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optical proximity correction (24) 24
photolithographie (24) 24
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psm (23) 23
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mask (20) 20
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alternating phase-shifting mask (16) 16
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maskentechnik (15) 15
opc (15) 15
resolution enhancement technology (15) 15
computer simulation (14) 14
optimization (14) 14
physics (14) 14
alternating phase shifting mask (13) 13
encryption (13) 13
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ret (10) 10
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attenuated phase shifting mask (9) 9
chemically amplified resist (9) 9
high transmittance (9) 9
hole pattern (9) 9
intensity imbalance (9) 9
light (9) 9
maske (9) 9
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submikrometerbereich (8) 8
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157 nm lithography (7) 7
157-nm lithography (7) 7
aberration monitor (7) 7
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Nanotechnology, ISSN 0957-4484, 01/2017, Volume 28, Issue 4, p. 045304
A one-step graphene patterning method is developed in this paper. A phase shifting mask is used to modulate incident laser beam spatially and generate graphene patterns by laser heating... 
monolayer graphene | laser patterning | phase shifting mask | PHYSICS, APPLIED | FILMS | MATERIALS SCIENCE, MULTIDISCIPLINARY | NANOSCIENCE & NANOTECHNOLOGY | HYBRID SYSTEMS | LITHOGRAPHY
Journal Article
Microelectronic engineering, ISSN 0167-9317, 2015, Volume 143, pp. 74 - 80
Journal Article
Applied Physics Express, ISSN 1882-0778, 7/2013, Volume 6, Issue 7, pp. 076502 - 076502-3
In this report, we propose palladium oxide (PdO) as an absorber material for an EUV mask that can print line-and-space patterns with a half pitch down to 14 nm... 
ARF LITHOGRAPHY | PHASE-SHIFTING MASKS | PRINTABILITY | PHYSICS, APPLIED | FLARE | EUV WAVELENGTHS | ANGLE | SIMULATION
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2011, Volume 8166
Phase-shifting effect of EUV masks with various absorber thicknesses has been studied both by simulations and experiments... 
Phase-shifting effect | Thin absorber | EUV mask | Photomasks | Attenuation | Simulation | Lithography | Masks | Imaging
Conference Proceeding
Journal of micro/nanolithography, MEMS, and MOEMS, ISSN 1932-5150, 4/2014, Volume 13, Issue 2, pp. 023003 - 023003
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2010, Volume 7823, Issue 1
For mask signature matching in the case of alternating phase-shifting mask it is shown that it is can be achieved using matching of aerial imaging... 
AIMS | Alternating phase shifting mask | Mask process matching | Aerial image | Matching | Copying | Imaging | Proving | Photomasks | Aerials | Signatures | Masks
Conference Proceeding
Optics Express, ISSN 1094-4087, 09/2017, Volume 25, Issue 18, pp. 21775 - 21785
... of electromagnetic fields propagating from mask to wafer plane cannot be ignored, rendering... 
PHASE-SHIFTING MASKS | DESIGN | EFFICIENT SOURCE | MICROLITHOGRAPHY | OPTIMIZATION | PIXELATED SOURCE | OPTICS | INVERSE LITHOGRAPHY | OPTICAL LITHOGRAPHY
Journal Article
Journal of the Optical Society of America A: Optics and Image Science, and Vision, ISSN 1084-7529, 2013, Volume 30, Issue 1, pp. 112 - 123
.... Source and mask optimization (SMO) has emerged as a key technique used to further improve the imaging performance of immersion lithography... 
DESIGN | PARTIALLY COHERENT ILLUMINATION | PHASE-SHIFTING MASK | RESOLUTION | BINARY | OPTICS | INVERSE LITHOGRAPHY | OPTICAL LITHOGRAPHY
Journal Article
Journal of micro/nanolithography, MEMS, and MOEMS, ISSN 1932-5150, 4/2016, Volume 15, Issue 2, pp. 021203 - 021203
...m and structure sizes down to 2  μm. This is the first time that an experimental analysis of light propagation through a mask is presented in detail, which includes information on intensity and phase... 
high-resolution interference microscopy | phase-shifting mask | proximity printing | light evolution | DISPLACEMENT TALBOT LITHOGRAPHY | IMAGES | MATERIALS SCIENCE, MULTIDISCIPLINARY | ENHANCEMENT | NANOSCIENCE & NANOTECHNOLOGY | OPTICS | ENGINEERING, ELECTRICAL & ELECTRONIC
Journal Article
Optics Express, ISSN 1094-4087, 04/2013, Volume 21, Issue 7, pp. 8076 - 8090
Source mask optimization (SMO) is a powerful and effective technique to obtain sufficient process stability in optical lithography, particularly in view of the challenges associated with 22 nm process technology and beyond... 
INVERSE | PHASE-SHIFTING MASKS | OPTICS | Models, Theoretical | Molecular Imaging - methods | Scattering, Radiation | Computer Simulation | Light | Photography - methods
Journal Article
Applied Physics Express, ISSN 1882-0778, 02/2008, Volume 1, Issue 2, p. 22005
A new simple interference exposure method using a phase-shifting mask was discussed on the basis of Fourier synthesis for fabricating blazed gratings... 
GRATINGS | PHYSICS, APPLIED | FABRICATION | ELECTRON-BEAM LITHOGRAPHY
Journal Article
Proceedings of SPIE - The International Society for Optical Engineering, ISSN 0277-786X, 2009, Volume 7520
Conference Proceeding
Journal of the Optical Society of America A: Optics and Image Science, and Vision, ISSN 1084-7529, 07/2012, Volume 29, Issue 7, pp. 1300 - 1312
Recently, a set of gradient-based optical proximity correction (OPC) and phase-shifting mask (PSM... 
PHASE-SHIFTING MASKS | DESIGN | PARTIALLY COHERENT ILLUMINATION | RESOLUTION ENHANCEMENT | BINARY | MICROLITHOGRAPHY | OPTICS | INVERSE LITHOGRAPHY
Journal Article
Microelectronic Engineering, ISSN 0167-9317, 08/2016, Volume 161, pp. 104 - 108
...) and a deep ultra-violet light source. DTL is a recently developed mask-based photolithography for forming high-resolution periodic structures over large areas using a relatively simple and low-cost system... 
Sub-100 nm | Phase shifting masks | Deep ultra violet | Photolithography | Talbot lithography | PHASE-SHIFTING MASKS | PHYSICS, APPLIED | NANOSCIENCE & NANOTECHNOLOGY | OPTICS | ENGINEERING, ELECTRICAL & ELECTRONIC | Integrated circuit fabrication | Numerical analysis | Printing | Electron beam lithography | Lithography | Nanostructure | Arrays | Masks | Displacement | Periodic structures
Journal Article
Journal of Physics D: Applied Physics, ISSN 0022-3727, 08/2008, Volume 41, Issue 15, pp. 153001 - 153001 (29)
.... Using resolution enhancement techniques such as alternating phase shift and chrome-less phase shift masks (PSMs... 
PHYSICS, APPLIED | PHASE-SHIFTING MASK | RESOLUTION ENHANCEMENT | MESOSCOPIC RING MAGNETS | FERROMAGNETIC NANOWIRES | OPTICAL LITHOGRAPHY | ION IRRADIATION | ANTIREFLECTIVE COATINGS | INTERFERENCE LITHOGRAPHY | ANTIDOT ARRAYS | GIANT MAGNETORESISTANCE
Journal Article
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, ISSN 0021-4922, 01/2007, Volume 46, Issue 1, pp. 105 - 110
The applications of a high-transmittance embedded layer (HTEL) (T = 15-35%) in an attenuated phase-shifting mask were studied by simulation with the aid of Taguchi design of experiment... 
Process window | Taguchi design of experiment | Immersion lithography | Transmittance control mask | High-transmittance embedded layer | PHYSICS, APPLIED | immersion lithography | PATTERN | transmittance control mask | process window | high-transmittance embedded layer | NM LITHOGRAPHY
Journal Article
Optics Letters, ISSN 0146-9592, 2015, Volume 40, Issue 13, pp. 3169 - 3172
.... In this research the absolute optical-thickness distribution of mask blank glass was measured using DFT and wavelength-tuning Fizeau interferometry without using sensitive phase-shifting techniques... 
EXCESS FRACTION METHOD | LOW-COHERENCE INTERFEROMETRY | SCANNING INTERFEROMETER | PHASE-SHIFTING INTERFEROMETRY | REFRACTIVE-INDEX | MICROSCOPE | TRANSPARENT PLATES | INTERFERENCE | OPTICS | Blanks | Systematic errors | Glass | Fourier analysis | Measurement methods | Optical components | Optical thickness | Masks
Journal Article
Journal of Micro Nanolithography MEMS and MOEMS, ISSN 1932-5150, 03/2004, Volume 3, Issue 2, pp. 293 - 304
<160 nm depending on exposure dose. Arrays of vortices with can be patterned using a chromeless phase-edge mask composed of rectangles with nominal phases of 0, 90, 180, and 270 deg... 
phase-shifting mask | optical vortex | contact | via | double exposure | Double exposure | Phase-shifting mask | Contact | Optical vortex | Via | MATERIALS SCIENCE, MULTIDISCIPLINARY | RESOLUTION | OPTICS | LITHOGRAPHY | ENGINEERING, ELECTRICAL & ELECTRONIC
Journal Article
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