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2010, 1. Aufl., Wiley series in pure and applied optics, ISBN 047059697X, xv, 226
A Unified Summary of the Models and Optimization Methods Used in Computational LithographyOptical lithography is one of the most challenging areas of current... 
Integrated circuits | Microlithography | Resolution (Optics) | Semiconductors | Mathematics | Etching | Design and construction | Photolithography | Optical Electronics
Book
1979, Graphic arts series, ISBN 9780826927514, 214
Book
1974, 5th ed., ISBN 0883620057, 1 v. (various pagings)
Book
1973, ISBN 9780912920214, xiii, 442
Book
1970, 4th ed. --, 1 v. (various pagings)
Book
1968, Informal report (United States. Naval Oceanographic Office), Volume 68-73., v, 24
Book
1903, ix, [3], 104, 32 p., [1] leaf of plates
Book
Optics Letters, ISSN 0146-9592, 07/2018, Volume 43, Issue 14, p. 3200
Efficient light coupling to integrated photonic devices is of key importance to a wide variety of applications. “Inverse nanotapers” are widely used, in which... 
Coupling | Photolithography | Photonics
Journal Article
Optics Express, ISSN 1094-4087, 06/2014, Volume 22, Issue 13, pp. 16310 - 16321
The application of the phase-shift method allows a significant resolution enhancement for proximity lithography in mask aligners. Typically a resolution of 3... 
PHOTOLITHOGRAPHY | FABRICATION | OPTICS
Journal Article
Applied Physics Letters, ISSN 0003-6951, 06/2011, Volume 98, Issue 23, pp. 233101 - 233101-3
Subwavelength electroluminescent sources with spatial, spectral, and polarization controlling capabilities are critical elements for optical imaging and... 
MICROSCOPY | PHOTOLITHOGRAPHY | PHYSICS, APPLIED
Journal Article
1989, Proceedings / SPIE--the International Society for Optical Engineering, ISBN 0819401218, Volume 1086., viii, 620
Book
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