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International Journal of Applied Glass Science, ISSN 2041-1286, 10/2018, Volume 9, Issue 4, pp. 499 - 509
The paper reports on the reactive ion etching (RIE) and ion beam etching (IBE) of commercially available glasses and their usability for the fabrication of diffractive optical elements as an alternative for expensive quartz glass... 
reactive ion etching of various glass materials | CF4/Ar plasma | diffractive optical elements | Ar plasma | SF6 | SILICA | PLASMAS | PYREX | MATERIALS SCIENCE, CERAMICS | QUARTZ | SIO2 | MASK | Optical components | Surface roughness | Quartz | Gas mixtures | Ion beams | Silica glass | Reaction products | Gratings (spectra) | Ion etching | Reactive ion etching | Dependence | Surface properties | Borosilicate glasses | Fused quartz | Usability | Diffractive optical elements
Journal Article
Solar energy materials and solar cells, ISSN 0927-0248, 2011, Volume 95, Issue 1, pp. 2 - 6
...) is too difficult for thinner wafer to apply due to a large amount of silicon loss. However, Plasma surface texturing using Reactive Ion Etching (RIE... 
Solar cell | Light trapping | Reactive ion etching | Surface texturing | Multicrystalline silicon | TEXTURE | PHYSICS, APPLIED | ENERGY & FUELS | MATERIALS SCIENCE, MULTIDISCIPLINARY | MONOCRYSTALLINE SILICON | Solar energy industry | Silicon | Solar cells | Photovoltaic cells | Wafers | Texturing | Density | Conversion
Journal Article
Diamond & Related Materials, ISSN 0925-9635, 10/2017, Volume 79, pp. 164 - 172
Journal Article
Journal of Physics D: Applied Physics, ISSN 0022-3727, 06/2014, Volume 47, Issue 23, pp. 1 - 14
In this paper, general aspects of the reactive ion etching (RIE) technique will be described, such as anisotropy, loading effect, lag effect, RIE chemistries... 
GaN | InP | loading and lag effects | micro-masking | GaAs | nano-photonics | RIE | PHYSICS, APPLIED | SILICON | ALGAAS | PHOTONIC CRYSTALS | INDUCTIVELY-COUPLED PLASMA | BOSCH PROCESS | CL-2 | FABRICATION | Reactive ion etching | Semiconductors | Gallium nitrides | Etching | Materials selection | Criteria | Dielectrics | Crystal structure
Journal Article
Applied physics. A, Materials science & processing, ISSN 1432-0630, 2016, Volume 122, Issue 9, pp. 1 - 5
Journal Article
Physica status solidi. A, Applications and materials science, ISSN 1862-6300, 2018, Volume 215, Issue 22, pp. 1800273 - n/a
.... In this work, the synthetic diamond reactive ion etching (RIE) process is studied. The effects of the gas mixture and bias on the diamond etching rate are investigated... 
microfabrication | synthetic diamond | interface structures | reactive ion etching | GRATINGS | PHYSICS, CONDENSED MATTER | PHYSICS, APPLIED | MATERIALS SCIENCE, MULTIDISCIPLINARY | HIGH-VOLTAGE | Anisotropy | Diamonds | Etching | Selectivity | Masks | Molybdenum | Sputtering | Aluminum oxide | Organic chemistry | Ion etching | Reactive ion etching | Submerging | Nickel | Plasmas
Journal Article
Surface & coatings technology, ISSN 0257-8972, 2018, Volume 354, pp. 153 - 160
Amorphous carbon thin films were grown by magnetron sputtering on crystalline Si and fluorine-doped tin oxide (FTO) substrates and annealed at 600 °C in... 
Plasma nanotexturing | Reactive ion etching | Surface roughness | Amorphous carbon | RAMAN-SPECTRA | PHYSICS, APPLIED | DIAMOND | O-2 | FTIR | SURFACE | MATERIALS SCIENCE, COATINGS & FILMS | Thin films | Atomic force microscopy | Annealing | Dielectric films | Batteries | Fluorides | Raman spectroscopy
Journal Article
Japanese Journal of Applied Physics, ISSN 1347-4065, 2006, Volume 45, Issue 5A, pp. 3988 - 3991
GaN striped structures along the (11 (2) over bar0) and. (1 (1) over bar 00) directions were fabricated by a combination etching technique, consisting of reactive ion etching followed by KOH wet etching... 
plane | Combination etching technique | Gallium nitride | Roughness | LIGHT-EMITTING-DIODES | DEVICE FABRICATION | PHYSICS, APPLIED | PLASMA | roughness | SURFACE | N-TYPE GAN | gallium nitride | combination etching technique | ALGAN/GAN | DAMAGE
Journal Article
IEEE Electron Device Letters, ISSN 0741-3106, 05/2014, Volume 35, Issue 5, pp. 521 - 523
This letter introduces a novel inductively coupled plasma-reactive ion etching (ICP-RIE) technique based on a BCl 3 /SiCl 4 /Ar chemistry for fabricating sub-20... 
MOSFET | Digital etch | Etching | Substrates | InGaAs | reactive ion etching | Logic gates | vertical channel | Indium gallium arsenide | Nanowires | Plasmas | top-down | nanowire | INP | CHEMISTRIES | ENGINEERING, ELECTRICAL & ELECTRONIC
Journal Article
Langmuir, ISSN 0743-7463, 06/2015, Volume 31, Issue 22, pp. 6245 - 6252
.... We demonstrate the transfer of the hexagonal pattern onto silicon by means of reactive ion etching through the masks... 
ORIENTATION | MATERIALS SCIENCE, MULTIDISCIPLINARY | CHEMISTRY, PHYSICAL | COPOLYMER THIN-FILMS | BLOCK-COPOLYMER | CHEMISTRY, MULTIDISCIPLINARY | MORPHOLOGY | THICKNESS
Journal Article
Journal of colloid and interface science, ISSN 0021-9797, 2016, Volume 481, pp. 82 - 90
.... In this study, deep reactive ion etching (DRIE) was used to create rough surfaces on PDMS substrates using a O2/CF4 plasma... 
Bioinspired | Superhydrophobic | Wear-resistant | Plasma etch | Transparent | Fluorination | NANOPARTICLES | POLYDIMETHYLSILOXANE | POLY(DIMETHYLSILOXANE) | CHEMISTRY, PHYSICAL | HYDROPHOBIC RECOVERY | SILICA FILMS
Journal Article
Microelectronic engineering, ISSN 0167-9317, 2018, Volume 192, pp. 61 - 65
Reactive Ion Etching (RIE) is used to improve the performance of commercial Complementary Metal Oxide Semiconductor (CMOS... 
Reactive ion etching | CMOS ISFET | CMOS | SILICON-NITRIDE | PHYSICS, APPLIED | PLASMA | NANOSCIENCE & NANOTECHNOLOGY | OPTICS | MICROFLUIDICS | ENGINEERING, ELECTRICAL & ELECTRONIC
Journal Article
Colloids and surfaces. A, Physicochemical and engineering aspects, ISSN 0927-7757, 2019, Volume 574, pp. 228 - 238
[Display omitted] We study the surface morphology, mass loss and wetting of fluorinated ethylene propylene surfaces which have been treated using reactive ion etching... 
Fluorinated polymer | Reactive ion etching | Nanostructures | Wetting | DROPS | POLYMERS | ENERGY | OXYGEN PLASMA | WETTABILITY | CHEMISTRY, PHYSICAL | STICKY | ADHESION | HYSTERESIS | SURFACE | WATER | Propylene | Polymers | Ethylene
Journal Article
Solar energy materials and solar cells, ISSN 0927-0248, 2014, Volume 127, pp. 21 - 26
The reactive ion etching in combination with acidic etching (acidic+RIE) is applied to form the front surface texturing of 156... 
Solar cells | Reactive ion etching | Multicrystalline silicon | Sheet resistance | PHYSICS, APPLIED | ENERGY & FUELS | MATERIALS SCIENCE, MULTIDISCIPLINARY | EMITTERS | Nitrides | Silicon | Solar batteries | Analysis | Silicon compounds | Scanning electron microscopy | Photovoltaic cells | Texturing | Density | Conversion
Journal Article